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公开(公告)号:US20220309216A1
公开(公告)日:2022-09-29
申请号:US17491739
申请日:2021-10-01
Applicant: Samsung Electronics Co., Ltd.
Inventor: Sangwoon LEE , Joohyun JEON , Sungjin KIM , Seunghyun KIM , Wonki ROH , Chulwoo PARK , Seongjae BYEON , Taeyoon AN , Hyoeun JUNG
IPC: G06F30/3308 , G06F30/25
Abstract: A method of modeling damages to a crystal caused by an incident particle includes obtaining particle information and crystal information; estimating energy loss of the incident particle based on the particle information and the crystal information; estimating a volume of a vacancy based on the energy loss; estimating a vacancy reaction based on the crystal information and the volume of the vacancy; and generating output data based on the vacancy reaction, the output data including quantification data of the damages.
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公开(公告)号:US20230180456A1
公开(公告)日:2023-06-08
申请号:US18059492
申请日:2022-11-29
Applicant: Samsung Electronics Co., Ltd.
Inventor: Euichul JEONG , Kiseok LEE , Wonki ROH , Hyungeun CHOI
IPC: H10B12/00
CPC classification number: H01L27/10805 , H01L27/1085 , H01L27/10873 , H01L27/10885
Abstract: A semiconductor memory device including a transistor body extending in a first horizontal direction and including a first source/drain region, a single-crystal channel layer, and a second source/drain region sequentially arranged in the first horizontal direction, a gate electrode layer extending in a second horizontal direction orthogonal to the first horizontal direction and covering upper and lower surfaces of the single-crystal channel layer, a bit line connected to the first source/drain region, extending in a vertical direction, and having a first width in the second horizontal direction, a spacer covering upper and lower surfaces of the first source/drain region and having a second width greater than the first width, and a cell capacitor on a side opposite to the bit line with respect to the transistor body in the first horizontal direction and including lower and upper electrode layers and a capacitor dielectric layer therebetween may be provided.
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