公开(公告)号：US20230408912A1

公开(公告)日：2023-12-21

申请号：US18328395

申请日：2023-06-02

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Jongkeun OH ,  Yongwoo KIM ,  Suzy ROH ,  Jongju PARK

IPC分类号： G03F1/74 ,  G03F1/24

CPC分类号： G03F1/74 ,  H01L21/0274 ,  G03F1/24

摘要： A method of manufacturing a photomask includes forming a photomask having a plurality of pattern elements, wherein the plurality of pattern elements include correction-target pattern elements having a critical dimension (CD) deviation; acquiring local CD correction information; directing a laser beam to a mirror array of a digital micromirror device (DMD), wherein the mirror array has mirrors arranged in a plurality of rows and a plurality of columns; converting the laser beam into a beam pattern array corresponding to the mirror array by controlling on/off switching of each of the mirrors based on the local CD correction information; forming a linear beam by focusing the beam pattern array through an optical system; applying an etchant to the photomask and directing the linear beam to the photomask and moving the linear beam to irradiate the photomask.

公开(公告)号：US20200349677A1

公开(公告)日：2020-11-05

申请号：US16862958

申请日：2020-04-30

申请人： SAMSUNG ELECTRONICS CO., LTD. ,  KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY

发明人： Hyunseung LEE ,  MunChurl KIM ,  Yongwoo KIM ,  Jae Seok CHOI ,  Youngsu MOON ,  Cheon LEE

IPC分类号： G06T5/00 ,  G06T5/50 ,  G06T7/13

摘要： An image processing apparatus obtains a first output image by applying an image to a first training network model, obtains a second output image by applying the image to a second training network model, and obtains a reconstructed image based on the first output image and the second output image. The first training network model is a model that uses a fixed parameter obtained through training of a plurality of sample images, the second training network model is trained to minimize a difference between a target image corresponding to the image and the reconstructed image.

公开(公告)号：US20230068821A1

公开(公告)日：2023-03-02

申请号：US17895252

申请日：2022-08-25

申请人： SAMSUNG ELECTRONICS CO., LTD.

发明人： Yongwoo KIM ,  Sera AN ,  Dongsuk LEE ,  Chanhui PARK ,  Seunghoon LEE ,  Michael CHOI

IPC分类号： G01R31/319 ,  G01R31/30

摘要： A monitoring circuit includes a sensor circuit having a plurality of devices and a selection circuit, which selects a device to be monitored among the plurality of devices, an input circuit, which applies, based on input digital data, a first signal to the device to be monitored and an output circuit, which generates output digital data based on a second signal generated by the sensor circuit. The input circuit includes a digital-to-analog converter, and the output circuit includes an analog-to-digital converter.

公开(公告)号：US20220283512A1

公开(公告)日：2022-09-08

申请号：US17508144

申请日：2021-10-22

申请人： Samsung Electronics Co., Ltd.

发明人： Sanguk PARK ,  Yongwoo KIM ,  Jongju PARK ,  Youngchang SEO ,  Jongkeun OH

IPC分类号： G03F7/20 ,  G02B26/10

摘要： A correcting apparatus of an extreme ultraviolet (EUV) photomask includes: a support portion configured to support an EUV photomask having a main area in which a plurality of pattern elements are arranged, a chemical supply unit configured to supply a chemical to the main area, a light source unit configured to generate a laser beam, and a control unit configured to irradiate the laser beam to the chemical supplied to the main area of the EUV photomask and to, based a laser dosage map for correcting critical dimensions (CDs) of the plurality of pattern elements in the main area, adjust a dosage of the laser beam based on the laser dosage map such that among the plurality of pattern elements, pattern elements having different critical dimensions are etched at different etching rates.