公开(公告)号：US20240184216A1

公开(公告)日：2024-06-06

申请号：US18242407

申请日：2023-09-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yoon Sang LEE ,  Eun Hee JEANG ,  Dong Hyeong KIM ,  Teun BOEREN ,  Jeong-Gil KIM ,  Kyung Bin PARK ,  Hyuck SHIN

IPC: G03F7/00

CPC classification number: G03F7/7055

Abstract: A monitoring unit for measuring, in real time, the power of an EUV beam transmitted to a substrate and a substrate treating apparatus including the monitoring unit. The substrate treating apparatus comprising a source which generates an EUV beam, a scanner which transfers a mask pattern to a substrate by using the EUV beam, and a monitoring unit which comprises a detector for detecting the EUV beam and monitoring the power of the EUV beam in real time, wherein the detector is disposed on a path along which the EUV beam passes through a first mirror assembly provided in the scanner and moves to a reticle on which the mask pattern is formed.