公开(公告)号：US20130153489A1

公开(公告)日：2013-06-20

申请号：US13716997

申请日：2012-12-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： You Hwan SON ,  Hye Young KONG ,  Sung Soo HAN

IPC: B01D71/02 ,  B01D67/00

CPC classification number: B01D71/024 ,  B01D61/025 ,  B01D67/0006 ,  B01D67/0039 ,  B01D67/0079 ,  B01D69/148 ,  B01D71/56 ,  B01D71/58 ,  B01D2325/36 ,  C02F1/44

Abstract: Example embodiments herein relate to a semi-permeable film including a nanoporous material and a polymer matrix. The nanoporous material includes a nanoporous core and a coating layer that is disposed on a surface of the nanoporous core. The coating layer may include a particle selected from a metal hydroxide particle, a metal oxide particle, and a combination thereof. A separation membrane may include the semi-permeable film. Example embodiments also relate to a method of manufacturing the semi-permeable film and the separation membrane.

Abstract translation: 本文的示例性实施方案涉及包括纳米多孔材料和聚合物基质的半透膜。 纳米多孔材料包括纳米多孔芯和设置在纳米多孔芯的表面上的涂层。 涂层可以包括选自金属氢氧化物颗粒，金属氧化物颗粒及其组合的颗粒。 分离膜可以包括半透膜。 示例性实施例还涉及半透膜和分离膜的制造方法。

公开(公告)号：US20140141231A1

公开(公告)日：2014-05-22

申请号：US14024092

申请日：2013-09-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： You Hwan SON ,  Jae Eun KIM ,  Bo Kyung JUNG ,  Hyo Rang KANG

IPC: B01D69/04

CPC classification number: B01D67/0058 ,  B01D67/006 ,  B01D67/0093 ,  B01D71/02 ,  B01D71/024 ,  B01D71/027 ,  Y10T428/249953

Abstract: A method of selectively modifying a structure including preparing a structure including a nano-sized through-pore, filling the nano-sized through-pore with a surfactant, removing a portion of the surfactant from both ends of the nano-sized through-pore to expose a portion of an internal surface of the nano-sized through-pore, modifying the exposed internal surface of the nano-sized through-pore with a first compound, removing the surfactant from the nano-sized through-pore having the internal surface modified with the first compound to expose an internal surface that remains unmodified with the first compound, and modifying with a second compound the exposed internal surface without being modified with the first compound, the second compound being different from the first compound.

Abstract translation: 选择性地修饰结构的方法，包括制备包括纳米尺寸通孔的结构，用表面活性剂填充纳米尺寸的通孔，从纳米尺寸的通孔的两端除去一部分表面活性剂到 暴露纳米尺寸通孔的内表面的一部分，用第一化合物修饰纳米尺寸通孔的暴露内表面，从具有内表面改性的纳米尺寸通孔去除表面活性剂 第一化合物暴露出用第一化合物保持未修饰的内表面，并且用第二化合物修饰暴露的内表面而不用第一化合物进行改性，第二化合物不同于第一化合物。