公开(公告)号：US20250081320A1

公开(公告)日：2025-03-06

申请号：US18638916

申请日：2024-04-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae LEE ,  Ohkug KWON ,  Youngduk SUH ,  Sunghyup KIM ,  Jeonggil KIM ,  Yebin NAM ,  Daegeun YOON ,  Seungpyo HONG

IPC: H05G2/00 ,  G03F7/00

Abstract: An extreme ultraviolet (EUV) light generating device includes a vessel having an internal space, a droplet generator generating droplets to be supplied to the internal space, a droplet emitter emitting the droplets generated by the droplet generator to the internal space, a laser light source generating a laser beam to generate EUV light by reaction with the droplets, a condensing mirror adjacent to the laser light source to at least partially surround the laser light source and concentrating EUV light on an intermediate focus (IF), and gas lock nozzles around the IF to respectively constitute rows and ejecting a flow control gas to the internal space, wherein a tilted direction of a gas lock nozzle in at least one of the rows is tilted in a direction consistent with a tilted direction of a sidewall of the vessel with respect to a central axis direction of the internal space.

公开(公告)号：US20220308339A1

公开(公告)日：2022-09-29

申请号：US17508224

申请日：2021-10-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Changsoon LIM ,  Youngdo KIM ,  Daewon KANG ,  Chansoo KANG ,  Hoonseop KIM ,  Sangki NAM ,  Youngduk SUH ,  Donghyub LEE ,  Jonghun PI

IPC: G02B27/00 ,  G06T7/00 ,  B08B7/04 ,  B08B7/00 ,  G03F7/20 ,  G01N33/00

Abstract: A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.