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公开(公告)号：US20220308339A1
公开(公告)日：2022-09-29
申请号：US17508224
申请日：2021-10-22
发明人： Changsoon LIM , Youngdo KIM , Daewon KANG , Chansoo KANG , Hoonseop KIM , Sangki NAM , Youngduk SUH , Donghyub LEE , Jonghun PI
摘要： A method of cleaning a collector of an extreme ultraviolet light source system includes introducing the collector separated from the extreme ultraviolet light source system into a chamber; capturing an optical image of a reflective surface of the collector; measuring a contamination level of the reflective surface by comparing the optical image with a prestored standard image; performing a first cleaning operation if the contamination level exceeds a preset first reference value, the first cleaning operation including cleaning the reflective surface by spraying dry ice particles onto the reflective surface; and performing a second cleaning operation if the contamination level is less than or equal to the preset first reference value. The second cleaning operation includes cleaning the reflective surface by radiating atmospheric plasma onto the reflective surface and measuring a microcontamination level and a damage level of the reflective surface.
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公开(公告)号：US20230197423A1
公开(公告)日：2023-06-22
申请号：US17942368
申请日：2022-09-12
发明人： Sungyong LIM , Chansoo KANG , Youngdo KIM , Namkyun KIM , Sungyeol KIM , Sangki NAM , Seungbo SHIM , Kyungmin LEE
CPC分类号： H01J37/32935 , G01J1/44 , H01J37/32174 , G01J2001/446
摘要： A diagnostic device for diagnosing distribution of a radical in a plasma processing chamber, the diagnostic device, may include a spectrometer receiving an optical signal through at least one optical channel connected to the plasma processing chamber, and performing spectral analysis on the optical signal in response to a synchronization signal corresponding to each of states of a multi-level pulse applied to the plasma processing chamber and a synchronizer generating the synchronization signal corresponding to each of the states of the multi-level pulse.
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公开(公告)号：US20240047247A1
公开(公告)日：2024-02-08
申请号：US18184418
申请日：2023-03-15
发明人： Chansoo KANG , Daewon KANG , Sangki NAM , Jungmo YANG , Changsoon LIM , Sungho JANG , Jonghun PI , Youngil KANG , Yoonjae KIM , Ilwoo KIM , Jongmu KIM , Yongbeom PARK
CPC分类号： H01L21/67253 , H01J37/32944 , H01J2237/221
摘要： A semiconductor process device includes a chamber housing defining an internal region and a plurality of electrostatic chucks within the internal region. The chamber housing includes a window, and a light collection unit including a first optical system and a second optical system located at different positions on the window. A plurality of first optical pickup units are connected to the first optical system, and a plurality of second optical pickup units are connected to the second optical system. A sensor includes a plurality of photodetectors that are configured to convert a first optical signal transmitted by the plurality of first optical pickup units and a second optical signal transmitted by the plurality of second optical pickup units into electrical signals. A processor is configured to generate a spatial image of the internal region of the chamber housing using the electrical signals output by the plurality of photodetectors, and determine a location at which an arc occurs in the internal region of the chamber housing based on the spatial image.
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公开(公告)号：US20230102201A1
公开(公告)日：2023-03-30
申请号：US17874475
申请日：2022-07-27
发明人： Vladimir Vsevolodovich PROTOPOPOV , Vasily Grigorievich PASHKOVSKIY , Chansoo KANG , Youngdo KIM , Hoonseop KIM , Sangki NAM , Sejin OH , Changsoon LIM
IPC分类号： H01J37/32
摘要： A device for measuring a density of plasma is provided. The device includes a first sensor configured to measure a microwave spectrum of an input port reflection parameter of plasma, the first sensor having a probe including a conductive material and a flat plate shape, and a second sensor configured to measure an optical signal generated from the plasma, the second sensor being configured to detect the optical signal through the probe of the first sensor.
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