公开(公告)号：US20230266066A1

公开(公告)日：2023-08-24

申请号：US18090094

申请日：2022-12-28

Applicant: Samsung Electronics Co., Ltd.

Inventor： Younhaeng Lee ,  Gwangwon Son ,  Jieun Jang ,  Wuyoung Choi ,  Eunhye Park

IPC: F28D7/08 ,  B08B3/10 ,  B08B13/00

CPC classification number: F28D7/082 ,  B08B3/10 ,  B08B13/00 ,  B08B2203/007

Abstract: A fluid supply includes a first fluid source configured to supply a first fluid, a second fluid source configured to supply a second fluid, a heat exchanger configured to exchange heat between the first fluid and the second fluid, a first fluid recovery tank configured to recover the first fluid that has passed through the heat exchanger, and a first transfer pipe configured to transfer the first fluid from the first fluid source to the first fluid recovery tank via the heat exchanger. The heat exchanger may be disposed at a vertical level higher than a vertical level of the first fluid recovery tank.

公开(公告)号：US20230398499A1

公开(公告)日：2023-12-14

申请号：US18139828

申请日：2023-04-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Wuyoung Choi ,  Cheolmin Shin ,  Seungyong Yang ,  Younhaeng Lee ,  Changyeol Ham

IPC: B01D65/02 ,  C02F1/44 ,  B01D61/14

CPC classification number: B01D65/02 ,  C02F2103/04 ,  B01D61/145 ,  C02F1/444

Abstract: A method of cleaning an ultrafiltration membrane module includes installing an ultrafiltration membrane in an ultrafiltration membrane module, supplying deionized water to the ultrafiltration membrane module, and flushing the ultrafiltration membrane module with the deionized water by increasing decreasing a flow rate of the deionized water supplied to the ultrafiltration membrane module.

公开(公告)号：US20230264997A1

公开(公告)日：2023-08-24

申请号：US18111160

申请日：2023-02-17

Applicant: Samsung Electronics Co., Ltd.

Inventor： Younhaeng Lee ,  Cheolmin Shin ,  Seungyong Yang ,  Wuyoung Choi ,  Changyeol Ham

IPC: C02F9/00 ,  B01D61/02 ,  B01D61/04 ,  B01D61/06 ,  B01D19/00

CPC classification number: C02F9/00 ,  B01D19/0031 ,  B01D61/04 ,  B01D61/06 ,  B01D61/026 ,  C02F1/42

Abstract: An ultrapure water manufacturing facility includes: a first tank; a plurality of reverse osmosis membranes sequentially arranged downstream of the first tank; an electrodeionization device arranged downstream of the plurality of reverse osmosis membranes; an ion exchange resin tower arranged downstream of the electrodeionization device and filled with a boron selective resin; and a chemical supplier arranged between the plurality of reverse osmosis membranes and configured to supply a pH regulator to treatment-target water.