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公开(公告)号:US10892171B2
公开(公告)日:2021-01-12
申请号:US15859480
申请日:2017-12-30
Applicant: Samsung Electronics Co., Ltd. , CYMECHS Inc.
Inventor: Heokjae Lee , Hahn Park , Jae Boo Kim , Dongil Yoon , MinYoung Hwang , Se Un Park , Kang-Min Park , Yongjoon Hong , Sung Baek Kim , Woo Jin Park
IPC: B08B7/00 , H01L21/67 , H01L21/677
Abstract: A removal apparatus for removing residual gases and a substrate treating facility for removing residual gases is disclosed. The residual gas removal apparatus includes a housing, a gas supply for providing a non-reactive gas into the housing, a supporting member provided to support a substrate and positioned in the housing, a heat radiating member spaced apart from the supporting member and positioned in the housing, and a heating unit for providing heat toward the supporting member and positioned between the heat radiating member and the supporting member.