专利检索 ap:("Sandip AGARWAL" OR "Graciela Beatriz BLANCHET" OR "Brian T. MAYERS" OR "Joseph M. MCLELLAN" OR "Patrick REUST" OR "Eric STERN" OR "Jennifer GILLIES" OR "Ralf KÜGLER") AND inv:"Ralf KÜGLER" 第 1 页

1.

发明申请
Methods for Patterning Substrates Using Heterogeneous Stamps and Stencils and Methods of Making the Stamps and Stencils 审中-公开
标题翻译：使用异质印模和模板印刷基板的方法和制作印模和模板的方法

公开(公告)号：US20110076448A1

公开(公告)日：2011-03-31

申请号：US12859953

申请日：2010-08-20

申请人： Sandip AGARWAL , Graciela Beatriz BLANCHET , Brian T. MAYERS , Joseph M. MCLELLAN , Patrick REUST , Eric STERN , Jennifer GILLIES , Ralf KÜGLER

发明人： Sandip AGARWAL , Graciela Beatriz BLANCHET , Brian T. MAYERS , Joseph M. MCLELLAN , Patrick REUST , Eric STERN , Jennifer GILLIES , Ralf KÜGLER

IPC分类号： B41N1/24 , G03F7/20 , B05D1/32 , B32B3/24

CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0388 , Y10T428/24331

摘要： The present invention is directed to heterogeneous stamp and stencil compositions, methods for patterning substrates using contact printing processes employing the heterogeneous stamps and stencils, and products formed by the contact printing processes.

摘要翻译： 本发明涉及不均匀印模和模版组合物，使用采用不均匀印刷和模版的接触印刷方法图案化基板的方法以及通过接触印刷方法形成的产品。

2.

发明申请
Stencils for High-Throughput Micron-Scale Etching of Substrates and Processes of Making and Using the Same 审中-公开
标题翻译：用于高通量微量刻蚀基板的模板及其制造和使用过程

公开(公告)号：US20120097329A1

公开(公告)日：2012-04-26

申请号：US13112166

申请日：2011-05-20

申请人： Eric STERN , Graciela Beatriz BLANCHET , Lindsay HUNTING , Brian T. MAYERS , Joseph M. MCLELLAN , Patrick REUST , Ralf KÜGLER , Jennifer GILLIES

发明人： Eric STERN , Graciela Beatriz BLANCHET , Lindsay HUNTING , Brian T. MAYERS , Joseph M. MCLELLAN , Patrick REUST , Ralf KÜGLER , Jennifer GILLIES

IPC分类号： H01L21/308 , B29C59/16

CPC分类号： B44C1/227 , B41C1/148 , B41N1/24 , G03F7/027 , G03F7/12 , G03F7/16

摘要： The present invention is directed to stencils for high-throughput, high-resolution etching of substrates and processes of making and using the same.

摘要翻译： 本发明涉及用于基板的高通量，高分辨率蚀刻和制造和使用它们的工艺的模版。