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1.发明公开公开(公告)号：US20240045108A1
公开(公告)日：2024-02-08
申请号：US17641410
申请日：2021-10-19
Applicant: Sang-Ro LEE , Katsushi IGARASHI
Inventor： Sang-Ro LEE , Katsushi IGARASHI
CPC classification number: G02B1/118 , C09K13/08 , C03C23/0075 , C03C15/00 , C03C23/0085
Abstract: A wet etching method according to the present disclosure includes cleaning the glass, forming a nanoscale pattern by wet-etching the cleaned glass, and cleaning and drying the nano-patterned glass, wherein a wet etching solution used in the wet etching includes hydrofluoric acid and a surfactant. According to the present disclosure, a glass having high transmittance/low reflectance can be provided. The glass can be applied to an optical device and a display including a mobile device.
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