公开(公告)号：US06441554B1

公开(公告)日：2002-08-27

申请号：US09854655

申请日：2001-05-14

Applicant: Kee-Seok Nam ,  Sang-Ro Lee ,  Jong-Ju Rha ,  Koo-Hyun Lee ,  Jong-Kuk Kim

Inventor： Kee-Seok Nam ,  Sang-Ro Lee ,  Jong-Ju Rha ,  Koo-Hyun Lee ,  Jong-Kuk Kim

IPC: H01J724

CPC classification number: A61L9/22 ,  C01B13/11 ,  C01B2201/14 ,  C01B2201/22 ,  C01B2201/24 ,  C01B2201/32 ,  C02F1/72 ,  C02F2201/48 ,  C02F2201/782 ,  C02F2305/023 ,  H01J37/32009

Abstract: Disclosed is an apparatus for generating low-temp plasma at atmospheric pressure, comprising: a couple of electrodes facing each other at a distance, one of them being connected to a power supply, the other being grounded; a couple of dielectrics with a thickness of 25 &mgr;m-10 mm, positioned on the facing surfaces of the electrodes in such a way as to face each other, one of them having at least one discharge gap therein; and a conductor electrode having at least one tip positioned within the discharge gap, in which an electric field is applied at an intensity of 1-100 KV/cm through the power supply across the electrodes by use of a pulse direct current or an alternating current in a frequency bandwidth of 50 Hz-10 GHz while a reaction gas is fed between the electrodes, so as to induce a hollow cathode discharge, a capillary discharge or the high accumulation of charges from the discharge gap.

Abstract translation: 公开了一种用于在大气压下产生低温等离子体的装置，包括：一对彼此面对的电极，其中一个电极连接到电源，另一个电极接地; 一对厚度为25mum-10mm的电介质，以彼此面对的方式定位在电极的相对表面上，其中一个在其中具有至少一个放电间隙; 以及导体电极，其具有位于放电间隙内的至少一个尖端，其中以1-100KV / cm的强度施加电场，通过使用脉冲直流或交流电流通过电极通过电源施加电场 在50Hz-10GHz的频率带宽中，同时在电极之间供给反应气体，从而引起中空阴极放电，毛细管放电或来自放电间隙的高电荷累积。

公开(公告)号：US20240045108A1

公开(公告)日：2024-02-08

申请号：US17641410

申请日：2021-10-19

Applicant: Sang-Ro LEE ,  Katsushi IGARASHI

Inventor： Sang-Ro LEE ,  Katsushi IGARASHI

IPC: G02B1/118 ,  C09K13/08 ,  C03C23/00 ,  C03C15/00

CPC classification number: G02B1/118 ,  C09K13/08 ,  C03C23/0075 ,  C03C15/00 ,  C03C23/0085

Abstract: A wet etching method according to the present disclosure includes cleaning the glass, forming a nanoscale pattern by wet-etching the cleaned glass, and cleaning and drying the nano-patterned glass, wherein a wet etching solution used in the wet etching includes hydrofluoric acid and a surfactant. According to the present disclosure, a glass having high transmittance/low reflectance can be provided. The glass can be applied to an optical device and a display including a mobile device.

公开(公告)号：US06346181B1

公开(公告)日：2002-02-12

申请号：US09571821

申请日：2000-05-16

Applicant: Kyu Hwan Lee ,  Hyung-Sik Chung ,  Sang Ro Lee ,  Doyon Chang ,  Yongsoo Jeong ,  Jaimoo Yoo ,  Jae-Woong Ko ,  Hai-Doo Kim

Inventor： Kyu Hwan Lee ,  Hyung-Sik Chung ,  Sang Ro Lee ,  Doyon Chang ,  Yongsoo Jeong ,  Jaimoo Yoo ,  Jae-Woong Ko ,  Hai-Doo Kim

IPC: C25D500

CPC classification number: C25D5/18 ,  C25D3/12 ,  C25D5/006 ,  C25D5/50

Abstract: Disclosed is an Ni-plated layer of biaxial texture, which is formed by electroplating. In the Ni-plated layer,peaks measured on a &thgr;-rocking curve have a FWHM of 7° or less in terms of the misorientation on the c-axis; and peaks measured on &phgr;-scan have a FWHM of 21° or less in terms of the misorientation on the plane formed by the a-axis and the b-axis. Also, a process of electroplating a Ni layer are disclosed. The process comprises forming a Ni-plated layer of biaxial texture under a magnetic field by electroplating and subjecting the Ni-plated layer to thermal treatment to develop the biaxial texture. This electroplating process is expected to give a significant contribution to the development of the electroplating technology and to replace the vacuum deposition used for the preparation of thin film magnetic materials or thin film piezoelectric materials.

Abstract translation: 公开了通过电镀形成的双轴织构的镀镍层。 在Ni镀层中，在θ-摇摆曲线上测量的峰在c轴上的取向偏差方面的FWHM为7°以下; 以扫描方式测量的峰值在由a轴和b轴形成的平面上的取向方向上FWHM为21°以下。 此外，公开了一种电镀Ni层的工艺。 该方法包括通过电镀在磁场下形成双轴织构的Ni镀层，并对Ni镀层进行热处理以形成双轴织构。 这种电镀工艺有望为电镀技术的发展作出重大贡献，并取代了用于制备薄膜磁性材料或薄膜压电材料的真空沉积。