公开(公告)号：US06432622B1

公开(公告)日：2002-08-13

申请号：US09679558

申请日：2000-10-06

申请人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

发明人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

IPC分类号： G03F742

CPC分类号： C11D7/5022 ,  C11D11/0047 ,  G03F7/422 ,  H01L21/31133

摘要： A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.

公开(公告)号：US06458518B1

公开(公告)日：2002-10-01

申请号：US10045062

申请日：2002-01-15

申请人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

发明人： Sang-sik Moon ,  Mi-sook Jeon ,  Pil-kwon Jun ,  June-ing Kil ,  Je-eung Park ,  Sang-mun Chun

IPC分类号： G03F742

CPC分类号： C11D7/5022 ,  C11D11/0047 ,  G03F7/422 ,  H01L21/31133

摘要： A photoresist stripper composition is formed of a mixture of acetone, &ggr;-butyrolactone, and ester solvent. A photoresist stripping method includes spraying the photoresist stripper composition over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and thereafter the photoresist stripper composition is again sprayed over the substrate while rotating the substrate at a relatively high speed. Then, the substrate is rinsed with pure water.