公开(公告)号：US06478875B1

公开(公告)日：2002-11-12

申请号：US09518224

申请日：2000-03-02

申请人： Sanjay Sampath ,  Jiri Matejicek

发明人： Sanjay Sampath ,  Jiri Matejicek

IPC分类号： C23L1600

CPC分类号： C23C4/12 ,  C23C24/04

摘要： An apparatus for performing in-situ curvature measurement of a substrate during a deposition process is provided which includes a clamp for retaining the substrate near one end while leaving the opposite end free. A plurality of displacement sensors are arranged in a spaced apart fashion along the length of the substrate and are directed to a surface of the substrate opposite a surface to be coated. Each sensor provides a signal to a computer corresponding to a position of the substrate relative to the sensor. The computer receives and stores data from the displacement sensors to determine a stress evolution during a deposition process and to determine a coating modulus based upon a resultant curvature of the substrate.

摘要翻译： 提供一种用于在沉积工艺期间执行基底的原位曲率测量的装置，其包括用于将基板保持在一端附近的夹具，同时使相对端保持自由。 多个位移传感器沿着衬底的长度以间隔的方式布置并且被引导到衬底的与待涂覆的表面相对的表面。 每个传感器向计算机提供对应于衬底相对于传感器的位置的信号。 计算机接收和存储来自位移传感器的数据以确定沉积过程期间的应力演变，并且基于所得到的基底的曲率确定涂层模量。