公开(公告)号：US20100178750A1

公开(公告)日：2010-07-15

申请号：US12503784

申请日：2009-07-15

申请人： Satoshi Murakami ,  Akihiko Endo ,  Nobuyuki Morimoto ,  Hideki Nishihata

发明人： Satoshi Murakami ,  Akihiko Endo ,  Nobuyuki Morimoto ,  Hideki Nishihata

IPC分类号： H01L21/18

CPC分类号： H01L21/76254 ,  H01L21/76256

摘要： A bonded wafer is produced by removing a part or all of native oxide films formed on each surface of both a wafer for active layer and a wafer for support substrate to be bonded; forming a uniform oxide film with a thickness of less than 5 nm on at least one surface of these wafers by a given oxide film forming method; bonding the wafer for active layer to the wafer for support substrate through the uniform oxide film; thinning the wafer for active layer; and subjecting the bonded wafer to a given heat treatment in a non-oxidizing atmosphere to substantially remove the uniform oxide film existing in the bonding interface.

摘要翻译： 通过去除在有源层的晶片和待接合的支撑基板的晶片的每个表面上形成的一部分或全部自然氧化膜来制造键合晶片; 通过给定的氧化膜形成方法在这些晶片的至少一个表面上形成厚度小于5nm的均匀氧化物膜; 通过均匀的氧化膜将用于有源层的晶片结合到用于支撑衬底的晶片; 减薄晶圆的活性层; 并且在非氧化性气氛中使接合晶片进行给定的热处理，以基本上除去存在于接合界面中的均匀氧化膜。

公开(公告)号：US07851337B2

公开(公告)日：2010-12-14

申请号：US11801461

申请日：2007-05-09

申请人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/00 ,  H01L21/30 ,  H01L21/46 ,  H01L21/425

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having no oxide film wherein hydrogen ions are implanted into a wafer for active layer having no oxide film on its surface to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了即使在没有氧化膜的层叠晶片中也抑制诸如空隙或起泡的缺陷的发生的方法，其中将氢离子注入到其表面上没有氧化膜的有源层的晶片中以形成氢离子注入层 ，除了氢以外的离子被注入到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，将活性层用的晶片层叠在支撑基板用的晶片上， 活性层晶片在氢离子注入层处被剥离。

公开(公告)号：US07795117B2

公开(公告)日：2010-09-14

申请号：US11796005

申请日：2007-04-25

申请人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/322 ,  H01L21/301

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having an oxide film of a thickness thinner than the conventional one, wherein hydrogen ions are implanted into a wafer for active layer having an oxide film of not more than 50 nm in thickness to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate through the oxide film, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了一种抑制诸如空隙或气泡之类的缺陷的发生的方法，即使在具有比常规厚度的氧化膜更薄的氧化膜的层压晶片中，其中将氢离子注入到具有氧化物膜的有源层的晶片中 不大于50nm的厚度以形成氢离子注入层，并且注入氢以外的离子到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，以及用于 通过氧化膜将有源层层压到用于支撑衬底的晶片上，然后在氢离子注入层处剥离有源层晶片。

公开(公告)号：US20090075453A1

公开(公告)日：2009-03-19

申请号：US12270753

申请日：2008-11-13

申请人： Satoshi MURAKAMI ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi MURAKAMI ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/762

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having an oxide film of a thickness thinner than the conventional one, wherein hydrogen ions are implanted into a wafer for active layer having an oxide film of not more than 50 nm in thickness to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate through the oxide film, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了一种抑制诸如空隙或气泡之类的缺陷的发生的方法，即使在具有比常规厚度的氧化膜更薄的氧化膜的层压晶片中，其中将氢离子注入到具有氧化物膜的有源层的晶片中 不大于50nm的厚度以形成氢离子注入层，并且注入氢以外的离子到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，以及用于 通过氧化膜将有源层层压到用于支撑衬底的晶片上，然后在氢离子注入层处剥离有源层晶片。

公开(公告)号：US20110027969A1

公开(公告)日：2011-02-03

申请号：US12903139

申请日：2010-10-12

申请人： Satoshi MURAKAMI ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi MURAKAMI ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/762

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having no oxide film wherein hydrogen ions are implanted into a wafer for active layer having no oxide film on its surface to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了即使在没有氧化膜的层叠晶片中也抑制诸如空隙或起泡的缺陷的发生的方法，其中将氢离子注入到其表面上没有氧化膜的有源层的晶片中以形成氢离子注入层 ，除了氢以外的离子被注入到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，将活性层用的晶片层叠在支撑基板用的晶片上， 活性层晶片在氢离子注入层处被剥离。

公开(公告)号：US20070264797A1

公开(公告)日：2007-11-15

申请号：US11801461

申请日：2007-05-09

申请人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/30 ,  H01L21/46

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having no oxide film wherein hydrogen ions are implanted into a wafer for active layer having no oxide film on its surface to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了即使在没有氧化膜的层叠晶片中也抑制诸如空隙或起泡的缺陷的发生的方法，其中将氢离子注入到其表面上没有氧化膜的有源层的晶片中以形成氢离子注入层 ，除了氢以外的离子被注入到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，将活性层用的晶片层叠在支撑基板用的晶片上， 活性层晶片在氢离子注入层处被剥离。

公开(公告)号：US08183133B2

公开(公告)日：2012-05-22

申请号：US12903139

申请日：2010-10-12

申请人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/00 ,  H01L21/30 ,  H01L21/46 ,  H01L21/425

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having no oxide film wherein hydrogen ions are implanted into a wafer for active layer having no oxide film on its surface to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了即使在没有氧化膜的层叠晶片中也抑制诸如空隙或起泡的缺陷的发生的方法，其中将氢离子注入到其表面上没有氧化膜的有源层的晶片中以形成氢离子注入层 ，除了氢以外的离子被注入到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，将活性层用的晶片层叠在支撑基板用的晶片上， 活性层晶片在氢离子注入层处被剥离。

公开(公告)号：US07951692B2

公开(公告)日：2011-05-31

申请号：US12270753

申请日：2008-11-13

申请人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/322 ,  H01L21/301

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having an oxide film of a thickness thinner than the conventional one, wherein hydrogen ions are implanted into a wafer for active layer having an oxide film of not more than 50 nm in thickness to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate through the oxide film, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了一种抑制诸如空隙或气泡之类的缺陷的发生的方法，即使在具有比常规厚度的氧化膜更薄的氧化膜的层压晶片中，其中将氢离子注入到具有氧化物膜的有源层的晶片中 不大于50nm的厚度以形成氢离子注入层，并且注入氢以外的离子到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，以及用于 通过氧化膜将有源层层压到用于支撑衬底的晶片上，然后在氢离子注入层处剥离有源层晶片。

公开(公告)号：US20070275566A1

公开(公告)日：2007-11-29

申请号：US11796005

申请日：2007-04-25

申请人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

发明人： Satoshi Murakami ,  Nobuyuki Morimoto ,  Hideki Nishihata ,  Akihiko Endo

IPC分类号： H01L21/31

CPC分类号： H01L21/76254

摘要： There is provided a method for suppressing the occurrence of defects such as voids or blisters even in the laminated wafer having an oxide film of a thickness thinner than the conventional one, wherein hydrogen ions are implanted into a wafer for active layer having an oxide film of not more than 50 nm in thickness to form a hydrogen ion implanted layer, and ions other than hydrogen are implanted up to a position that a depth from the surface side the hydrogen ion implantation is shallower than the hydrogen ion implanted layer, and the wafer for active layer is laminated onto a wafer for support substrate through the oxide film, and then the wafer for active layer is exfoliated at the hydrogen ion implanted layer.

摘要翻译： 提供了一种抑制诸如空隙或气泡之类的缺陷的发生的方法，即使在具有比常规厚度的氧化膜更薄的氧化膜的层压晶片中，其中将氢离子注入到具有氧化物膜的有源层的晶片中 不大于50nm的厚度以形成氢离子注入层，并且注入氢以外的离子到从氢离子注入的表面侧的深度比氢离子注入层浅的位置，以及用于 通过氧化膜将有源层层压到用于支撑衬底的晶片上，然后在氢离子注入层处剥离有源层晶片。

公开(公告)号：US07858494B2

公开(公告)日：2010-12-28

申请号：US11466964

申请日：2006-08-24

申请人： Akihiko Endo ,  Hideki Nishihata ,  Nobuyuki Morimoto

发明人： Akihiko Endo ,  Hideki Nishihata ,  Nobuyuki Morimoto

IPC分类号： H01L21/30 ,  H01L21/46

CPC分类号： H01L21/762 ,  H01L21/76254 ,  H01L21/76256 ,  H01L27/1203

摘要： Adhesion of particles due to static buildup during a laminated substrate manufacturing process is constrained, so as to reduce generation of a void or a blister in a lamination step and improve yield. A laminate 13 is formed by superimposing a first semiconductor substrate 11, which is to be an active layer, on a second semiconductor substrate 12, which is to be a supporting substrate, via an oxide film 11a. Electric resistance of either or both of the first and second semiconductor substrates 11 and 12 before superimposition is 0.005-0.2 Ωcm.

摘要翻译： 在层叠基板制造过程中由于静电积聚引起的颗粒的粘附受到限制，从而减少层压步骤中的空隙或泡罩的产生并提高产量。 通过将作为有源层的第一半导体基板11经由氧化膜11a叠加在作为支撑基板的第二半导体基板12上而形成层叠体13。 叠加之前的第一和第二半导体基板11和12中的任一个或两者的电阻为0.005-0.2Ω·cm。