Three-axis image stabilization system
    1.
    发明授权
    Three-axis image stabilization system 有权
    三轴图像稳定系统

    公开(公告)号:US08212880B2

    公开(公告)日:2012-07-03

    申请号:US12339444

    申请日:2008-12-19

    IPC分类号: H04N5/228

    摘要: An image stabilization system includes an optical assembly configured to receive electromagnetic radiation emitted by a target and produce focused image of the target; a focal plane array, the focal plane array being configured to receive the image and integrate at least a portion of the electromagnetic radiation making up the image to produce an electrical representation of the image; sensors configured to provide kinematic data; a control system receiving the kinematic data and estimating jitter-induced motion of the image on the focal plane and outputting a control signal; and actuators configured to receive the control signal and to translate the focal plane along two orthogonal axes and rotate the focal plane about a third orthogonal axis such that jitter-induced motion of the image on the focal plane is reduced.

    摘要翻译: 图像稳定系统包括被配置为接收由目标发射的电磁辐射并产生目标的聚焦图像的光学组件; 焦平面阵列,焦平面阵列被配置为接收图像并且对构成图像的电磁辐射的至少一部分进行积分以产生图像的电表示; 被配置为提供运动学数据的传感器; 接收运动学数据并估计焦平面上的图像的抖动引起的运动并输出控制信号的控制系统; 以及致动器,被配置为接收所述控制信号并沿着两个正交轴平移所述焦平面,并且围绕第三正交轴旋转所述焦平面,使得所述焦平面上的图像的抖动引起的运动减小。

    Three-Axis Image Stabilization System
    2.
    发明申请
    Three-Axis Image Stabilization System 审中-公开
    三轴图像稳定系统

    公开(公告)号:US20120212633A1

    公开(公告)日:2012-08-23

    申请号:US13461651

    申请日:2012-05-01

    IPC分类号: H04N5/228

    摘要: An image stabilization system includes an optical assembly configured to receive electromagnetic radiation emitted by a target and produce focused image of the target; a focal plane array, the focal plane array being configured to receive the image and integrate at least a portion of the electromagnetic radiation making up the image to produce an electrical representation of the image; sensors configured to provide kinematic data; a control system receiving the kinematic data and estimating jitter-induced motion of the image on the focal plane and outputting a control signal; and piezo-electric actuators configured to receive the control signal and to translate the focal plane along two orthogonal axes and rotate the focal plane about a third orthogonal axis such that jitter-induced motion of the image on the focal plane is reduced.

    摘要翻译: 图像稳定系统包括被配置为接收由目标发射的电磁辐射并产生目标的聚焦图像的光学组件; 焦平面阵列,焦平面阵列被配置为接收图像并且对构成图像的电磁辐射的至少一部分进行积分以产生图像的电表示; 被配置为提供运动学数据的传感器; 接收运动学数据并估计焦平面上的图像的抖动引起的运动并输出控制信号的控制系统; 以及压电致动器,被配置为接收控制信号并沿着两个正交轴平移焦平面并围绕第三正交轴旋转焦平面,使得焦平面上的图像的抖动引起的运动减小。

    Three-Axis Image Stabilization System
    3.
    发明申请
    Three-Axis Image Stabilization System 有权
    三轴图像稳定系统

    公开(公告)号:US20090160951A1

    公开(公告)日:2009-06-25

    申请号:US12339444

    申请日:2008-12-19

    IPC分类号: H04N5/228

    摘要: An image stabilization system includes an optical assembly configured to receive electromagnetic radiation emitted by a target and produce focused image of the target; a focal plane array, the focal plane array being configured to receive the image and integrate at least a portion of the electromagnetic radiation making up the image to produce an electrical representation of the image; sensors configured to provide kinematic data; a control system receiving the kinematic data and estimating jitter-induced motion of the image on the focal plane and outputting a control signal; and actuators configured to receive the control signal and to translate the focal plane along two orthogonal axes and rotate the focal plane about a third orthogonal axis such that jitter-induced motion of the image on the focal plane is reduced.

    摘要翻译: 图像稳定系统包括被配置为接收由目标发射的电磁辐射并产生目标的聚焦图像的光学组件; 焦平面阵列,焦平面阵列被配置为接收图像并且对构成图像的电磁辐射的至少一部分进行积分以产生图像的电表示; 被配置为提供运动学数据的传感器; 接收运动学数据并估计焦平面上的图像的抖动引起的运动并输出控制信号的控制系统; 以及致动器,被配置为接收所述控制信号并沿着两个正交轴平移所述焦平面,并且围绕第三正交轴旋转所述焦平面,使得所述焦平面上的图像的抖动引起的运动减小。

    Multi-step photomask etching with chlorine for uniformity control
    4.
    发明授权
    Multi-step photomask etching with chlorine for uniformity control 有权
    多级光掩模蚀刻用氯均匀性控制

    公开(公告)号:US07786019B2

    公开(公告)日:2010-08-31

    申请号:US11612036

    申请日:2006-12-18

    IPC分类号: H01L21/302

    CPC分类号: G03F1/30

    摘要: Methods for etching quartz are provided herein. In one embodiment, a method of etching quartz includes providing a film stack on a substrate support disposed in a processing chamber, the film stack having a quartz layer partially exposed through a patterned layer; and etching the quartz layer of the film stack in a multi-step process including a first step of etching the quartz layer utilizing a first process gas comprising at least one fluorocarbon process gas and a chlorine-containing process gas; and a second step of etching the quartz layer utilizing a second process gas comprising at least one fluorocarbon process gas.

    摘要翻译: 本文提供了蚀刻石英的方法。 在一个实施例中,蚀刻石英的方法包括在设置在处理室中的衬底支撑件上提供膜堆叠,所述膜堆叠具有部分地通过图案化层暴露的石英层; 并且以多步骤方法蚀刻所述薄膜叠层的石英层,其包括利用包括至少一种氟碳工艺气体和含氯工艺气体的第一工艺气体来蚀刻所述石英层的第一步骤; 以及利用包含至少一种氟碳工艺气体的第二工艺气体蚀刻所述石英层的第二步骤。

    MULTI-STEP PHOTOMASK ETCHING WITH CHLORINE FOR UNIFORMITY CONTROL
    5.
    发明申请
    MULTI-STEP PHOTOMASK ETCHING WITH CHLORINE FOR UNIFORMITY CONTROL 有权
    多级光电子蚀刻用氯乙烯进行均匀控制

    公开(公告)号:US20080142476A1

    公开(公告)日:2008-06-19

    申请号:US11612036

    申请日:2006-12-18

    IPC分类号: C23F1/00

    CPC分类号: G03F1/30

    摘要: Methods for etching quartz are provided herein. In one embodiment, a method of etching quartz includes providing a film stack on a substrate support disposed in a processing chamber, the film stack having a quartz layer partially exposed through a patterned layer; and etching the quartz layer of the film stack in a multi-step process including a first step of etching the quartz layer utilizing a first process gas comprising at least one fluorocarbon process gas and a chlorine-containing process gas; and a second step of etching the quartz layer utilizing a second process gas comprising at least one fluorocarbon process gas.

    摘要翻译: 本文提供了蚀刻石英的方法。 在一个实施例中,蚀刻石英的方法包括在设置在处理室中的衬底支撑件上提供膜堆叠,所述膜堆叠具有部分地通过图案化层暴露的石英层; 并且以多步骤方法蚀刻所述薄膜叠层的石英层,其包括利用包括至少一种氟碳工艺气体和含氯工艺气体的第一工艺气体来蚀刻所述石英层的第一步骤; 以及利用包含至少一种氟碳工艺气体的第二工艺气体蚀刻所述石英层的第二步骤。

    Memory system and associated methodology
    6.
    发明授权
    Memory system and associated methodology 失效
    内存系统和相关方法

    公开(公告)号:US07035134B2

    公开(公告)日:2006-04-25

    申请号:US10791131

    申请日:2004-03-02

    IPC分类号: G11C11/00

    CPC分类号: G11C11/419 G11C7/20

    摘要: A memory system includes a first plurality of memory cells, wherein each of the first plurality of memory cells includes a first node and a second node that are configured to have opposite logic values, and a second plurality of memory cells, wherein each of the second plurality of memory cells includes a first node and a second node that are configured to have opposite logic values. Providing a pre-program data value to the first nodes of the first plurality of memory cells, and to the second nodes of the second plurality of memory cells enables the memory system to be pre-programmed.

    摘要翻译: 存储器系统包括第一多个存储器单元,其中第一多个存储器单元中的每一个包括被配置为具有相反逻辑值的第一节点和第二节点,以及第二多个存储器单元,其中第二个 多个存储器单元包括被配置为具有相反逻辑值的第一节点和第二节点。 向第一多个存储器单元的第一节点和第二多个存储器单元的第二节点提供预编程数据值使得能够预编程存储器系统。