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公开(公告)号:US09368142B2
公开(公告)日:2016-06-14
申请号:US14035931
申请日:2013-09-24
Applicant: Seagate Technology LLC
Inventor: Jingsheng Chen , Huihui Li , Ganping Ju , Yingguo Peng
CPC classification number: G11B5/738 , C23C14/0641 , C23C14/08 , C23C14/14 , G11B5/65 , G11B5/667 , G11B5/7325
Abstract: A magnetic stack includes a substrate, a magnetic recording layer, and a TiN—X layer disposed between the substrate and the magnetic recording layer. In the TiN—X layer, X is a dopant comprising at least one of MgO, TiO, TiO2, ZrN, ZrO, ZrO2, HfN, HfO, AlN, and Al2O3.
Abstract translation: 磁性堆叠包括基板,磁记录层和设置在基板和磁记录层之间的TiN-X层。 在TiN-X层中,X是包含MgO,TiO,TiO 2,ZrN,ZrO,ZrO 2,HfN,HfO,AlN和Al 2 O 3中的至少一种的掺杂剂。
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公开(公告)号:US20140093748A1
公开(公告)日:2014-04-03
申请号:US14035931
申请日:2013-09-24
Applicant: Seagate Technology LLC
Inventor: Jingsheng Chen , Huihui Li , Ganping Ju , Yingguo Peng
CPC classification number: G11B5/738 , C23C14/0641 , C23C14/08 , C23C14/14 , G11B5/65 , G11B5/667 , G11B5/7325
Abstract: A magnetic stack includes a substrate, a magnetic recording layer, and a TiN—X layer disposed between the substrate and the magnetic recording layer. In the TiN—X layer, X is a dopant comprising at least one of MgO, TiO, TiO2, ZrN, ZrO, ZrO2, HfN, HfO, AlN, and Al2O3.
Abstract translation: 磁性堆叠包括基板,磁记录层和设置在基板和磁记录层之间的TiN-X层。 在TiN-X层中,X是包含MgO,TiO,TiO 2,ZrN,ZrO,ZrO 2,HfN,HfO,AlN和Al 2 O 3中的至少一种的掺杂剂。
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