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公开(公告)号:US5663035A
公开(公告)日:1997-09-02
申请号:US420787
申请日:1995-04-12
申请人: Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
发明人: Seiya Masuda , Munirathna Padmanaban , Takanori Kudo , Yoshiaki Kinoshita , Natsumi Suehiro , Yuko Nozaki , Hiroshi Okazaki , Klaus Jurgen Przybilla
CPC分类号: G03F7/0045
摘要: A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.
摘要翻译: 用于生产半导体元件的辐射敏感性混合物,其具有高灵敏度和高分辨率,其可以通过碱性水溶液开发,并且其基于新的概念,其中稳定的酸潜像由 使用辐射分解碱。 该混合物的特征在于包含作为必需组分的a)不溶于水但可溶于碱性水溶液的粘合剂; b1)具有至少一个可被酸切割的键的化合物,或b2)具有至少一个键的化合物,其通过酸与化合物a)交联; c)当照射时产生酸的化合物; 和d)碱性碘鎓化合物。