公开(公告)号：US20140290698A1

公开(公告)日：2014-10-02

申请号：US14228512

申请日：2014-03-28

Applicant: Semes Co., Ltd.

Inventor： Tae Suk YUN ,  Byung Un KIM ,  Chang Yul CHO

IPC: B08B3/10

CPC classification number: H01L21/67253 ,  H01L21/67017 ,  H01L21/67051 ,  Y10T137/6606 ,  Y10T137/86027

Abstract: Provided is a substrate treatment apparatus including a housing, a supporting unit located inside the housing and supporting a substrate, a nozzle unit supplying chemicals to the substrate disposed on the supporting unit, and a chemical supplying unit supplying the chemicals to the nozzle unit. Herein, the chemical supplying unit includes a chemical supply source, a first tank and a second tank storing the chemicals, a chemical supplying line supplying the chemicals from the chemical supply source to the first tank and the second tank, a chemical discharge line supplying the chemicals from the first tank and the second tank to the nozzle unit, a circulation line allowing the chemicals to circulate through the first tank and the second tank, respectively, a member installed on the circulation line, and a controller controlling the member.

Abstract translation: 本发明提供一种基板处理装置，其具备壳体，位于壳体内部并支撑基板的支撑单元，向设置在支撑单元上的基板供给化学物质的喷嘴单元，以及向喷嘴单元供给化学品的化学供给单元。 这里，化学品供应单元包括化学品供应源，第一罐和储存化学品的第二罐，将化学品从化学品供应源提供给第一罐和第二罐的化学品供应管线， 从第一罐和第二罐到喷嘴单元的化学品，分别允许化学品通过第一罐和第二罐循环的循环管线，安装在循环管线上的部件和控制该部件的控制器。