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公开(公告)号：US20220208526A1
公开(公告)日：2022-06-30
申请号：US17456180
申请日：2021-11-23
Applicant: Semes Co., Ltd.
Inventor： Doosoon KIM , Sangmin MUN
IPC: H01J37/32
Abstract: An apparatus for processing a substrate may include an upper electrode, a gas distributing unit disposed under the upper electrode, a shower head disposed under the gas distributing unit, a temperature measuring unit including a first temperature sensor for measuring a temperature of the shower head, and a lower electrode disposed under the shower head. The first temperature sensor may pass through the upper electrode and the lower electrode and may make directly contact with the shower head.
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