公开(公告)号：US20150117987A1

公开(公告)日：2015-04-30

申请号：US14527936

申请日：2014-10-30

Applicant: Semes Co., Ltd.

Inventor： Jin Ho CHOI ,  Ju Mi YOO

IPC: H01L21/677 ,  B25J11/00 ,  F04B49/20

CPC classification number: F04B49/20 ,  F04B49/06 ,  F04B49/103 ,  F04B2201/0201 ,  F04B2201/0202 ,  H01L21/67259 ,  H01L21/67742

Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes: a transfer chamber conveying a substrate; a process chamber disposed adjacent to the transfer chamber and performing a treating process o the substrate; and a drive assembly supplying a power by which a component of the transfer chamber or the process chamber operates, wherein the drive assembly includes: a cylinder connected to pipes; a piston disposed to be movable inside the cylinder and connected to the component by a drive shaft; and a pipe control unit automatically adjusting a moving speed of the piston.

Abstract translation: 提供了一种基板处理装置。 基板处理装置包括：传送基板的传送室; 处理室，邻近所述传送室设置并执行所述衬底的处理过程; 以及驱动组件，其提供所述传送室或所述处理室的部件通过其工作的功率，其中所述驱动组件包括：连接到管道的气缸; 活塞，其设置成可在所述气缸内移动并通过驱动轴与所述部件连接; 以及管道控制单元自动调节活塞的移动速度。