SUPPORTING UNIT AND SUBSTRATE TREATMENT APPARATUS
    1.
    发明申请
    SUPPORTING UNIT AND SUBSTRATE TREATMENT APPARATUS 审中-公开
    支撑单元和基板处理装置

    公开(公告)号:US20140319121A1

    公开(公告)日:2014-10-30

    申请号:US14264410

    申请日:2014-04-29

    CPC classification number: H01L21/67109 H01L21/67103

    Abstract: Provided is a supporting unit supporting a substrate. The supporting unit includes a body including a plurality of heating regions and disposed with the substrate on a top surface thereof and a heating unit heating the body. Herein, the heating unit includes heating lines provided in the plurality of heating regions, respectively, to control temperatures of the plurality of heating regions independently from one another, terminals provided to the body and receiving power from the outside, and connecting lines connecting the heating lines to the terminals mutually corresponding to one another. Also, the terminals are disposed in one of the plurality of heating regions in a top view.

    Abstract translation: 提供支撑基板的支撑单元。 支撑单元包括:主体,其包括多个加热区域,并且在其顶表面上设置有基板,加热单元加热主体。 这里,加热单元包括设置在多个加热区域中的加热管线,以分别彼此独立地控制多个加热区域的温度,设置到主体的端子和从外部接收电力,以及连接加热区域的连接线 到彼此相互对应的端子的线。 此外,端子在顶视图中设置在多个加热区域中的一个中。

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