公开(公告)号：US09748117B2

公开(公告)日：2017-08-29

申请号：US13665169

申请日：2012-10-31

Applicant: Semes Co., Ltd.

Inventor： Unkyu Kang ,  Sungun Kim

IPC: F27D7/00 ,  H01L21/67

CPC classification number: H01L21/67017 ,  Y10T137/8593

Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes a chamber, a support member disposed within the chamber to support a substrate, and an exhaust member for exhausting a gas within an inner space of the chamber to the outside of the chamber. A trap space for collecting fumes contained in the gas is defined in the exhaust member.