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公开(公告)号:US09705004B2
公开(公告)日:2017-07-11
申请号:US14812028
申请日:2015-07-29
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Yoshiyuki Kobayashi , Shinpei Matsuda , Daisuke Matsubayashi , Hiroyuki Tomisu
IPC: H01L29/78 , H01L29/04 , H01L29/786 , G02F1/1368 , H01L21/822 , H01L27/06
CPC classification number: H01L29/7869 , G02F1/1368 , G02F2201/58 , H01L21/8221 , H01L27/0688 , H01L29/045 , H01L29/78696
Abstract: A transistor whose channel is formed in a semiconductor having dielectric anisotropy is provided. A transistor having a small subthreshold swing value is provided. A transistor having normally-off electrical characteristics is provided. A transistor having a low leakage current in an off state is provided. A semiconductor device includes an insulator, a semiconductor, and a conductor. In the semiconductor device, the semiconductor includes a region overlapping with the conductor with the insulator positioned therebetween, and a dielectric constant of the region in a direction perpendicular to a top surface of the region is higher than a dielectric constant of the region in a direction parallel to the top surface.
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公开(公告)号:US10134911B2
公开(公告)日:2018-11-20
申请号:US15644940
申请日:2017-07-10
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Yoshiyuki Kobayashi , Shinpei Matsuda , Daisuke Matsubayashi , Hiroyuki Tomisu
IPC: H01L29/786 , G02F1/1368 , H01L21/822 , H01L27/06 , H01L29/04
Abstract: A transistor whose channel is formed in a semiconductor having dielectric anisotropy is provided. A transistor having a small subthreshold swing value is provided. A transistor having normally-off electrical characteristics is provided. A transistor having a low leakage current in an off state is provided. A semiconductor device includes an insulator, a semiconductor, and a conductor. In the semiconductor device, the semiconductor includes a region overlapping with the conductor with the insulator positioned therebetween, and a dielectric constant of the region in a direction perpendicular to a top surface of the region is higher than a dielectric constant of the region in a direction parallel to the top surface.
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