公开(公告)号：US20230185182A1

公开(公告)日：2023-06-15

申请号：US17986104

申请日：2022-11-14

申请人： Semiconductor Manufacturing International (Beijing) Corporation

发明人： Ge ZHANG ,  Zhongwen YAN

IPC分类号： G03F1/38 ,  G03F1/70 ,  G06F30/398

CPC分类号： G03F1/38 ,  G03F1/70 ,  G06F30/398

摘要： The present disclosure relates to an optical proximity correction method and system. The correction method may include providing main patterns and setting a forbidden edge rule according to a spacing between adjacent main patterns. The method may further include adding an auxiliary pattern to a side portion of the main patterns. A quantity of auxiliary patterns added to side portions of the main patterns is obtained based on the forbidden edge rule. The forbidden edge rule defines whether an edge of the main patterns is a forbidden edge, and an auxiliary pattern is not added to a side portion of the forbidden edge.