Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same
    1.
    发明授权
    Photosensitive resin composition controlling solubility and pattern formation method of double-layer structure using the same 有权
    控制溶解度的光敏树脂组合物和使用其的双层结构的图案形成方法

    公开(公告)号:US07611826B2

    公开(公告)日:2009-11-03

    申请号:US12351398

    申请日:2009-01-09

    IPC分类号: G03F7/00 G03F7/004

    摘要: The present invention relates to a new photosensitive resin composition capable of solubility control and a pattern formation method of a double-layer structure using the same, and more particularly to a photosensitive resin composition that can control the -value using a new photopolymerization initiator and lower layer hardener and that can control a film thickness according to the exposure energy without pattern breakup, even with low exposure energy. This photosensitive resin composition is useful for color filters and overcoating materials of LCD (liquid crystal display) manufacturing processes.

    摘要翻译: 本发明涉及一种能够进行溶解度控制的新的感光性树脂组合物和使用该感光性树脂组合物的双层结构的图案形成方法,更具体地说,涉及可以控制 - 使用 新的光聚合引发剂和下层硬化剂,并且即使在低曝光能量下也可以根据曝光能量控制膜厚而无图案破裂。 该感光性树脂组合物可用于LCD(液晶显示)制造工艺的滤色器和外涂层材料。