摘要:
There is provided an air purifier having a dehumidification function, including: a body case having an inner space; a blower part installed in the inner space of the body case and drawing outside air from both sides of the body case through a single blower fan; an air purifying part purifying air drawn from one side of the body case; and a dehumidifying part removing moisture from air drawn from the other side of the body case by a dehumidifying rotor. Through the blower part drawing the air from both sides of the body case, the air purifier purifies the air drawn from one side of the body case and dehumidifies the air drawn from the other side of the body case. Accordingly, a drop in an airflow amount caused by concurrently performing the dehumidification and the purification may be alleviated, so improved dehumidification and purification effects are achieved.
摘要:
There is provided an air purifier having a dehumidification function, including: a body case having an inner space; a blower part installed in the inner space of the body case and drawing outside air from both sides of the body case through a single blower fan; an air purifying part purifying air drawn from one side of the body case; and a dehumidifying part removing moisture from air drawn from the other side of the body case by a dehumidifying rotor. Through the blower part drawing the air from both sides of the body case, the air purifier purifies the air drawn from one side of the body case and dehumidifies the air drawn from the other side of the body case. Accordingly, a drop in an airflow amount caused by concurrently performing the dehumidification and the purification may be alleviated, so improved dehumidification and purification effects are achieved.
摘要:
Example embodiments relate to an apparatus and method for inspecting a substrate defect. The substrate defect inspecting apparatus includes a substrate, a light source emitting an infrared beam to the substrate, a detector detecting the infrared beam reflected from the substrate, and a defect analyzer receiving first information and second information from the detector and analyzing defects existing in the substrate. According to at least one example embodiment, the second information is acquired during a later process than the first information.
摘要:
An overlay measuring method includes irradiating an electron beam onto a sample, including a multi-layered structure of overlapped upper and lower patterns formed thereon, to obtain an actual image of the upper and lower patterns. A first image representing the upper pattern and a second image representing the lower pattern are obtained from the actual image. A reference position for the upper and lower patterns is determined from a design image of the upper and lower patterns. A position deviation of the upper pattern with respect to the reference position in the first image and a position deviation of the lower pattern with respect to the reference position in the second image are calculated to determine an overlay between the upper pattern and the lower pattern.