METHOD FOR SEPARATING EPITAXIAL LAYER FROM GROWTH SUBSTRATE
    1.
    发明申请
    METHOD FOR SEPARATING EPITAXIAL LAYER FROM GROWTH SUBSTRATE 有权
    从生长基底分离外延层的方法

    公开(公告)号:US20140335677A1

    公开(公告)日:2014-11-13

    申请号:US14361117

    申请日:2012-11-27

    CPC classification number: H01L21/02664 H01L21/0254 H01L21/02587 H01L33/0079

    Abstract: The present invention provides a method for separating an epitaxial layer from a growth substrate, comprising growing an epitaxial layer including a plurality of layers on a growth substrate; etching an edge of at least one layer in the epitaxial layer to form a notch; forming a bonding layer on the epitaxial layer, contacting a bonding substrate onto the bonding layer, and then heating the bonding layer to a bonding temperature for joining the epitaxial layer and the bonding substrate; and cooling the bonding layer after the heating of the boding layer, so that the epitaxial layer and the bonding substrate are joined by the bonding layer, and the epitaxial layer is separated from the growth substrate, wherein the separating the epitaxial layer from the growth substrate starts with separation from the at least one layer where the notch is formed.

    Abstract translation: 本发明提供了一种用于从生长衬底分离外延层的方法,包括在生长衬底上生长包括多个层的外延层; 蚀刻外延层中的至少一层的边缘以形成凹口; 在所述外延层上形成接合层,将接合基板接触到所述接合层上,然后将所述接合层加热至接合所述外延层和所述接合基板的接合温度; 并且在加热所述粘合层之后冷却所述接合层,使得所述外延层和所述接合基板通过所述接合层接合,并且所述外延层与所述生长基板分离,其中所述外延层与所述生长基板分离 从形成有凹口的至少一个层分离开始。

Patent Agency Ranking