摘要:
A method for fabrication a substrate for a liquid crystal display device includes: forming a color filter layer on a substrate; coating an organic layer on the color filter layer; irradiating a first light onto the organic layer; irradiating a second light onto the organic layer through a mask having a transmitting portion and a shielding portion, an energy density of the first light smaller than an energy density of the second light; and forming an overcoat layer and a column spacer by developing the organic layer.
摘要:
A method for fabrication a substrate for a liquid crystal display device includes: forming a color filter layer on a substrate; coating an organic layer on the color filter layer; irradiating a first light onto the organic layer; irradiating a second light onto the organic layer through a mask having a transmitting portion and a shielding portion, an energy density of the first light smaller than an energy density of the second light; and forming an overcoat layer and a column spacer by developing the organic layer.
摘要:
An in-plane switching mode liquid crystal display device includes a plurality of gate lines and data lines defining a plurality of pixel regions, a driving device disposed within each of the pixel regions, at least one first electrode having a first width and at least one second electrode having a second width both arranged within the pixel region, and at least one third electrode having a third width overlapping at least one of the first and second electrodes to form a storage capacitor.
摘要:
An IPS mode LCD device and a method for fabricating the same are disclosed. A switching device is formed at each unit pixel and then a passivation layer is formed thereon. A first concave pattern and a second concave pattern at each unit pixel by using one mask are formed, and a common electrode is formed in the first concave pattern and a pixel electrode is formed in the second concave pattern. Accordingly, the entire fabrication process is simplified.
摘要:
Disclosed herein are a thermoluminescent dosimeter for radiation monitoring, comprising LiF doped with Mg, Cu and Si, and a fabrication method thereof. The LiF:Mg,Cu,Si thermoluminescent dosimeter is fabricated by heating a LiF-based thermoluminescent powder material having a composition of LiF mother material, 0.1-0.5 mol % of a Mg compound, 0.001-0.05 mol % of a Cu compound and 0.5-1.3 mol % of a Si compound to a temperature of 900-1200° C. to melt the LiF-based material, cooling the melted material, compression-molding the cooled material, sintering the molded material, cooling the sintered material, and then annealing the cooled material. The thermoluminescent dosimeter has high thermal stability and thus maintains constant thermoluminescence sensitivity even when it is annealed at a high temperature of more than 240° C. Moreover, it has a remarkably low residual signal, and shows excellent dosimetric characteristics, because it can maintain the same sensitivity as its initial readout value, even when it is reused.
摘要:
A method of forming a silicon-on-insulator (SOI) semiconductor substrate includes implanting hydrogen ions into a support substrate to form a microbubble layer apart from a surface of the support substrate, forming an SOI layer on the microbubble layer, forming a diffusion barrier layer over the SOI layer, forming a buried oxide layer on a handle substrate, contacting the diffusion barrier layer with the buried oxide layer to be bonded, and annealing the bonded support and handle substrates to separate the support substrate from the SOI layer, wherein the diffusion barrier layer is formed by an insulating layer having a lower impurity diffusion coefficient as compared with the buried oxide layer.
摘要:
The disclosure concerns a pellet type LiF element for a thermoluminescent dosimetry (TLD) and its preparation. More particularly, the disclosure concerns the pellet type LiF element for a thermoluminescent dosimetry (TLD) which includes 0.35˜0.12% by mole of Mg source; 0.08˜0.001% by mole of Cu source; 1.3˜0.5% by mole of Na source; and 1.3˜0.5% by mole of Si source as dopants. The pellet type LiF element according to the present invention shows excellent sensitivity and has the preferred glow curve with a simple and single main peak.
摘要:
A method for forming SOI substrates including a SOI layer containing germanium and a strained silicon layer disposed on the SOI layer, comprises forming a relaxed silicon-germanium layer on a first silicon substrate using an epitaxial growth method, and forming a porous silicon-germanium layer thereon. A silicon-germanium epitaxial layer is formed on the porous silicon-germanium layer, an oxide layer is formed on a second silicon substrate, the second silicon substrate is bonded where the oxide layer is formed to the first silicon substrate where the silicon-germanium epitaxial layer is formed. Layers are removed to expose the silicon-germanium epitaxial layer and a strained silicon epitaxial layer is formed thereon. The porous silicon-germanium layer prevents lattice defects of the relaxed silicon-germanium layer from transferring to the silicon-germanium epitaxial layer. Therefore, it is possible to form the silicon-germanium layer and the strained silicon layer of the SOI layer without defects.
摘要:
Disclosed herein is a method for separating and purifying .alpha.-linolenic acid (ALA) from ALA-containing fatty acid mixtures by using a column chromatography, comprises the steps of: packing a column with silver nitrate(AgNO.sub.3)-impregnated silica gel as a stationary phase; passing the ALA-containing fatty acid mixtures through the column to adsorb the fatty acids to the stationary phase in the form of Ag.sup.+ -complexes; eluting the fatty acids with acetone-hexane mixtures; and collecting the fractions containing ALA having a purity of more than 95%.
摘要:
An array substrate for a wide viewing angle liquid crystal display device includes a gate line on a substrate, a data line crossing the gate line to define a pixel region, a thin film transistor electrically connected to the gate and data lines, a pixel electrode in the pixel region and connected to a drain electrode of the thin film transistor, the pixel electrode including two parts and an opening portion therebetween, a first common electrode in the opening portion, the first common electrode disposed on a same layer as the pixel electrode, a passivation layer on the pixel electrode and the first common electrode, the passivation layer having a common contact hole exposing the first common electrode, and a second common electrode on the passivation layer and connected to the first common electrode through the common contact hole, the second common electrode including first openings corresponding to the pixel electrode and a second opening corresponding to the opening portion.