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    Substrate manufacturing method for sensor applications using optical characteristics and the substrate therefrom
    2.
    发明授权
    Substrate manufacturing method for sensor applications using optical characteristics and the substrate therefrom 有权
    使用光学特性的传感器应用的基板制造方法及其基板

    公开(公告)号：US08414965B2

    公开(公告)日：2013-04-09

    申请号：US12741389

    申请日：2008-10-23

    申请人： Yong Jin Cho ,  Chul Jin Kim ,  Chong Tai Kim ,  Sung Wook Choi ,  Jae Ho Kim ,  Hyo Sop Kim ,  Jin Ho Kim

    发明人： Yong Jin Cho ,  Chul Jin Kim ,  Chong Tai Kim ,  Sung Wook Choi ,  Jae Ho Kim ,  Hyo Sop Kim ,  Jin Ho Kim

    IPC分类号： B05D5/12 ,  C23C14/28 ,  C23C14/30 ,  C23C14/14 ,  H05B6/00 ,  H05B7/00 ,  B05D1/18 ,  B05D3/00

    CPC分类号： G01N21/658 ,  G01N21/554 ,  Y10T428/24372 ,  Y10T428/31678

    摘要： A method for manufacturing a substrate of an analytical sensor and the substrate thus prepared are disclosed. The method for manufacturing the substrate of the sensor application according to the present invention is characterized in that it comprises (a) the step of preparing a dispersed solution of nanoparticles, which are stable in a volatile organic solvent due to surface modification of nanoparticles having a pre-designed certain size on the nanometer level with an organic functional group (b) the step of preparing a single layer film of nanoparticles surface-modified with the organic functional group on the interface using said dispersed solution of nanoparticles on the basis of the Langmuir-Blodgett method, and then transferring said single layer film of nanoparticles to the substrate; and (c) the step of coating the substrate to which said single layer film of nanoparticles is transferred, with the metal thin film by means of the vacuum vapor deposition, and then optionally removing nanoparticles to manufacture a nanostructure to be used as the analytical sensor using optical characteristics. According to the method for manufacturing the substrate of the sensor application according to the present invention as above, the nanoparticles can be uniformly fixed on the solid substrate having a great area above 10×10 cm2 using the Langmuir-Blodgett method, and by such method the size, distance and shape of nanoparticles can be controlled to manufacture the nanostructures to be used as the analytical sensor, which is possible to reproduce and mass-produce. When the sensitivity property of the sensor is measured using the nanostructure substrate, thus produced, to be used as the analytical sensor, it can be identified that the sensitivity can be highly improved.

    摘要翻译： 公开了一种用于制造如此制备的分析传感器和衬底的衬底的方法。 根据本发明的传感器应用的基板的制造方法的特征在于，其包括（a）制备纳米颗粒的分散溶液的步骤，所述分散溶液由于纳米颗粒的表面改性而在挥发性有机溶剂中稳定， 用有机官能团预先设计在纳米级上的一定尺寸（b）制备在界面上用有机官能团表面改性的纳米颗粒单层薄膜的步骤，该纳米粒子基于Langmuir -Blodgett方法，然后将所述单层纳米颗粒膜转移到基底; 和（c）通过真空气相沉积用金属薄膜涂覆纳米颗粒的单层膜转移到其上的基底的步骤，然后任选地除去纳米颗粒以制造用作分析传感器的纳米结构 使用光学特性。 根据如上所述的根据本发明的传感器应用的基板的制造方法，可以使用Langmuir-Blodgett方法将纳米颗粒均匀地固定在具有大于10×10cm 2的大面积的固体基板上，并且通过这种方法 可以控制纳米颗粒的尺寸，距离和形状，以制造用作分析传感器的纳米结构，其可以再现和批量生产。 当使用由此产生的纳米结构基板测量传感器的灵敏度特性作为分析传感器时，可以确定可以高度提高灵敏度。

    Liquid crystal display device having high brightness
    3.
    发明授权
    Liquid crystal display device having high brightness 有权
    具有高亮度的液晶显示装置

    公开(公告)号：US08085367B2

    公开(公告)日：2011-12-27

    申请号：US11148566

    申请日：2005-06-09

    申请人： Sung-Ki Kim ,  Yong-Jin Cho ,  Hae-Yeol Kim

    发明人： Sung-Ki Kim ,  Yong-Jin Cho ,  Hae-Yeol Kim

    IPC分类号： G02F1/1335 ,  G02F1/1333

    CPC分类号： G02F1/133615 ,  G02F1/133512

    摘要： A liquid crystal display device includes: a liquid crystal panel; a backlight assembly for irradiating light onto the liquid crystal panel; and a reflection layer between the liquid crystal panel and the backlight assembly for increasing an amount of light incident onto the liquid crystal panel.

    摘要翻译： 液晶显示装置包括：液晶面板; 用于将光照射到液晶面板上的背光组件; 以及液晶面板和背光组件之间的反射层，用于增加入射到液晶面板上的光量。

    METHOD AND APPARATUS FOR TESTING LIQUID CRYSTAL DISPLAY DEVICE
    4.
    发明申请
    METHOD AND APPARATUS FOR TESTING LIQUID CRYSTAL DISPLAY DEVICE 有权
    用于测试液晶显示器件的方法和装置

    公开(公告)号：US20080136440A1

    公开(公告)日：2008-06-12

    申请号：US12034422

    申请日：2008-02-20

    申请人： Jong Dam Kim ,  Hyun Kyu Lee ,  Yong Jin Cho ,  See Hwa Jeong

    发明人： Jong Dam Kim ,  Hyun Kyu Lee ,  Yong Jin Cho ,  See Hwa Jeong

    IPC分类号： G01R31/28 ,  G02F1/133

    CPC分类号： G02F1/136259 ,  G02F1/1303 ,  G02F1/136213 ,  G02F2001/136254 ,  G02F2001/136268 ,  G02F2203/69 ,  G09G3/006 ,  G09G3/3648 ,  G09G2300/0426

    摘要： A method and apparatus for testing a liquid crystal display device are provided to detect a defect location precisely and rapidly without requiring a jig. The method includes providing an inspection apparatus as a removable portion of the liquid crystal display device; inspecting the display part of the liquid crystal display device using the inspection apparatus; removing the inspection apparatus from the liquid crystal display device after the inspection is completed; and attaching driving circuits to the liquid crystal display device having the inspection apparatus removed therefrom.

    摘要翻译： 提供了用于测试液晶显示装置的方法和装置，用于在不需要夹具的情况下精确而快速地检测缺陷位置。 该方法包括提供作为液晶显示装置的可移除部分的检查装置; 使用检查装置检查液晶显示装置的显示部分; 在检查完成之后，从液晶显示装置中取出检查装置; 并且将驱动电路附接到具有从其去除的检查装置的液晶显示装置。

    Method and apparatus for testing liquid crystal display using electrostatic devices
    5.
    发明授权
    Method and apparatus for testing liquid crystal display using electrostatic devices 有权
    使用静电装置测试液晶显示器的方法和装置

    公开(公告)号：US07362124B2

    公开(公告)日：2008-04-22

    申请号：US11541577

    申请日：2006-10-03

    申请人： Jong Dam Kim ,  Hyun Kyu Lee ,  Yong Jin Cho ,  See Hwa Jeong

    发明人： Jong Dam Kim ,  Hyun Kyu Lee ,  Yong Jin Cho ,  See Hwa Jeong

    IPC分类号： G01R31/00

    CPC分类号： G09G3/006

    摘要： A method and apparatus are provided for inspecting an electrical defectiveness of a liquid crystal display substrate. The method includes shorting ESD protection devices with a conductive shorting bar to form a current path on each of signal wirings of the substrate, supplying a current to the signal wirings, and determining a defectiveness of the signal wirings depending on the current flowing on the signal wirings.

    摘要翻译： 提供了一种用于检查液晶显示基板的电气缺陷性的方法和装置。 该方法包括用导电短路棒短路ESD保护装置，以在基板的每个信号布线上形成电流路径，向信号布线提供电流，以及根据在信号上流动的电流来确定信号布线的缺陷 布线。

    Method, apparatus and system for reducing DC coupling capacitance at switching amplifier
    6.
    发明申请
    Method, apparatus and system for reducing DC coupling capacitance at switching amplifier 失效
    用于降低开关放大器DC耦合电容的方法，装置和系统

    公开(公告)号：US20080088371A1

    公开(公告)日：2008-04-17

    申请号：US11889419

    申请日：2007-08-13

    申请人： Seung-Bin You ,  Yong-JIn Cho

    发明人： Seung-Bin You ,  Yong-JIn Cho

    IPC分类号： H03F3/217

    CPC分类号： H03F3/2171

    摘要： A digital amplifier, a reference voltage generator for reducing a DC component of an amplified pulse width modulated signal of a digital amplifier, and a method of reducing a DC component of an amplified pulse width modulated signal applied to an input node of a load are described in this disclosure. The digital amplifier includes a pulse width modulation signal generator receiving an input signal and generating an amplified pulse width modulated signal, a filter filtering the amplified pulse width modulated signal and providing the filtered amplified pulse width modulated signal to an input node of a load, and a reference voltage generator providing a reference voltage to a reference node of the load to reduce a DC component of the filtered amplified pulse width modulated signal provided to the input node of the load.

    摘要翻译： 描述数字放大器，用于减小数字放大器的放大的脉宽调制信号的DC分量的参考电压发生器以及减小施加到负载的输入节点的经放大的脉宽调制信号的DC分量的方法 在本公开中。 数字放大器包括接收输入信号并产生放大的脉宽调制信号的脉冲宽度调制信号发生器，对经放大的脉宽调制信号进行滤波的滤波器，并将滤波后的放大脉宽调制信号提供给负载的输入节点，以及 参考电压发生器，将参考电压提供给负载的参考节点，以减小提供给负载的输入节点的滤波后的放大脉宽调制信号的直流分量。

    Elimination of pop-up noise in class D amplifier
    7.
    发明申请
    Elimination of pop-up noise in class D amplifier 有权
    消除D类放大器中的弹出式噪声

    公开(公告)号：US20070030061A1

    公开(公告)日：2007-02-08

    申请号：US11496693

    申请日：2006-07-31

    申请人： Yong-Jin Cho ,  Seung-Bin You

    发明人： Yong-Jin Cho ,  Seung-Bin You

    IPC分类号： H03F3/38

    CPC分类号： H03F1/305 ,  H03F3/217 ,  H03F2200/331 ,  H03F2200/351 ,  H03F2200/372

    摘要： A class D amplifier includes a driver circuit and a reset circuit. The driver circuit is configured to amplify a PWM (pulse width modulation) signal to generate an amplified PWM signal. The reset circuit applies a predetermined voltage at an input of the driver circuit for a time period after a power supply voltage is applied or before the power supply voltage is deactivated, for eliminating pop-up noise.

    摘要翻译： D类放大器包括驱动电路和复位电路。 驱动电路被配置为放大PWM（脉宽调制）信号以产生放大的PWM信号。 复位电路在施加电源电压之后或在电源电压被去激活之前的一段时间内在驱动器电路的输入端施加预定电压，以消除弹出噪声。

    Methods for adjusting light intensity for photolithography and related systems
    8.
    发明申请
    Methods for adjusting light intensity for photolithography and related systems 审中-公开
    调整光刻和相关系统光强度的方法

    公开(公告)号：US20060003240A1

    公开(公告)日：2006-01-05

    申请号：US11153787

    申请日：2005-06-15

    申请人： Woo-Seok Shim ,  Dae-Youp Lee ,  Joon-Sung Kim ,  In-Sang Song ,  Yong-Jin Cho

    发明人： Woo-Seok Shim ,  Dae-Youp Lee ,  Joon-Sung Kim ,  In-Sang Song ,  Yong-Jin Cho

    IPC分类号： G03C5/00 ,  G03B27/00

    CPC分类号： G03F7/203 ,  G03F7/70558 ,  G03F7/70625

    摘要： Correcting light intensity for photolithography may include irradiating light having a first light intensity distribution through a photo mask having a mask pattern to a photosensitive layer on a wafer to form a first pattern corresponding to the mask pattern. A distribution of critical dimensions of the first pattern corresponding to the mask pattern may be determined, and a second light intensity distribution may be determined based on a relation between the first light intensity distribution and the distribution of critical dimensions of the first pattern. Then, light having the second light intensity distribution may be irradiated. Related systems are also discussed.

    摘要翻译： 用于光刻的校正光强度可以包括将具有第一光强度分布的光通过具有掩模图案的光掩模照射到晶片上的感光层，以形成对应于掩模图案的第一图案。 可以确定与掩模图案对应的第一图案的临界尺寸的分布，并且可以基于第一光强度分布与第一图案的临界尺寸的分布之间的关系来确定第二光强度分布。 然后，可以照射具有第二光强度分布的光。 还讨论了相关系统。