公开(公告)号：US07590498B1

公开(公告)日：2009-09-15

申请号：US11948907

申请日：2007-11-30

申请人： Sherk Chung ,  Mukund Chakravarthy Venkatesh ,  Paxton Ming Kai Chow ,  Jiuyi Cheng ,  Paul Tran ,  Joseph Raymond Monkowski

发明人： Sherk Chung ,  Mukund Chakravarthy Venkatesh ,  Paxton Ming Kai Chow ,  Jiuyi Cheng ,  Paul Tran ,  Joseph Raymond Monkowski

IPC分类号： G01F17/00

CPC分类号： G01M3/38

摘要： Leaks in a processing chamber, including “virtual leaks” resulting from outgassing of material present within the chamber, may be detected utilizing an optical emission spectroscopy (OES) sensor configured to monitor light emitted from plasma of a sample from the chamber. According to certain embodiments, gas introduced into the chamber by the leak may be detected directly on the basis of its optical spectrum. Alternatively, gas introduced by the leak may be detected indirectly, based upon an optical spectrum of a material resulting from reaction of the gas attributable to the leak. According to one embodiment, data from the OES sensor is received by a processor that is configured to compute a leak detection index. The value of the leak detection index is compared against a threshold to determine if a leak is detected. If the value of the index crosses the threshold, a notification of the existence of a leak is sent.

摘要翻译： 可以利用配置成监测来自腔室的样品的等离子体发射的光的光发射光谱（OES）传感器来检测在处理室中的泄漏，包括由室内存在的物质的放气引起的“虚泄”。 根据某些实施例，可以基于其光谱直接检测通过泄漏引入到腔室中的气体。 或者，可以基于由归因于泄漏的气体的反应产生的材料的光谱，间接地检测由泄漏引入的气体。 根据一个实施例，来自OES传感器的数据被配置为计算泄漏检测指数的处理器接收。 将泄漏检测索引的值与阈值进行比较，以确定是否检测到泄漏。 如果索引的值超过阈值，则发送泄漏存在的通知。