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    MUSIC PLAYBACK SYSTEMS AND METHODS
    1.
    发明申请
    MUSIC PLAYBACK SYSTEMS AND METHODS 审中-公开
    音乐回放系统和方法

    公开(公告)号：US20080098875A1

    公开(公告)日：2008-05-01

    申请号：US11673620

    申请日：2007-02-12

    申请人： Shiau-Jiuan Chen ,  Jia-Han Li

    发明人： Shiau-Jiuan Chen ,  Jia-Han Li

    IPC分类号： G10H7/00

    CPC分类号： G11B27/105 ,  G11B27/11

    摘要： Music playback systems and methods. The system comprises a first storage device and a playback device. The first storage device comprises a plurality of first songs, and a first database storing song information of respective first songs. The playback device comprises a processing module. When the first storage device couples to the playback device, the processing module loads the first database to a temporary space, thus to be aware of the first songs in the first storage device, and provides the first songs on the playback device for selection and playback.

    摘要翻译： 音乐播放系统和方法。 该系统包括第一存储设备和播放设备。 第一存储装置包括多个第一首歌曲，以及存储各个第一首歌曲的歌曲信息的第一数据库。 播放装置包括处理模块。 当第一存储设备耦合到播放设备时，处理模块将第一数据库加载到临时空间，从而了解第一存储设备中的第一首歌曲，并将第一首歌曲提供在播放设备上用于选择和播放 。

    Method for calibrating a manufacturing process model
    2.
    发明授权
    Method for calibrating a manufacturing process model 有权
    校准制造工艺模型的方法

    公开(公告)号：US09541500B2

    公开(公告)日：2017-01-10

    申请号：US13599385

    申请日：2012-08-30

    申请人： Kuen-Yu Tsai ,  Alek Chi-Heng Chen ,  Jia-Han Li

    发明人： Kuen-Yu Tsai ,  Alek Chi-Heng Chen ,  Jia-Han Li

    IPC分类号： G06F17/50 ,  G01N21/47 ,  G01N21/956

    CPC分类号： G01N21/47 ,  G01N21/956

    摘要： Calibration of models for manufacturing processes that are subject to circuit layout proximity effects is performed, including optical proximity correction (OPC) model calibration. A target structure is produced using a layout and a manufacturing process. The target structure is illuminated and an electromagnetic scattering property is detected. A manufacturing process model for simulation of the manufacturing process is produced, which comprises at least one manufacturing process parameter determining a model electromagnetic scattering property using the manufacturing process model and the layout. The model electromagnetic scattering property is compared to the detected electromagnetic scattering property and based on the result of the comparison, calibrated manufacturing process parameters are output for calibrating the manufacturing process model. The determining and the layout may include determining structural information corresponding to the target structure using the manufacturing process model and determining the model electromagnetic scattering property using the structural information.

    摘要翻译： 执行电路布局邻近效应的制造工艺模型的校准，包括光学邻近校正（OPC）模型校准。 使用布局和制造过程生产目标结构。 照射目标结构并检测电磁散射特性。 制造用于制造过程模拟的制造过程模型，其包括使用制造过程模型和布局来确定模型电磁散射性质的至少一个制造工艺参数。 将模型电磁散射特性与检测到的电磁散射特性进行比较，并根据比较结果，输出校准的制造工艺参数，以校准制造工艺模型。 确定和布局可以包括使用制造过程模型确定与目标结构相对应的结构信息，并且使用结构信息确定模型电磁散射特性。

    Method for Calibrating a Manufacturing Process Model
    5.
    发明申请
    Method for Calibrating a Manufacturing Process Model 有权
    校准制造过程模型的方法

    公开(公告)号：US20130073070A1

    公开(公告)日：2013-03-21

    申请号：US13599385

    申请日：2012-08-30

    申请人： Kuen-Yu TSAI ,  Alek Chi-Heng Chen ,  Jia-Han Li

    发明人： Kuen-Yu TSAI ,  Alek Chi-Heng Chen ,  Jia-Han Li

    IPC分类号： G06F19/00

    CPC分类号： G01N21/47 ,  G01N21/956

    摘要： Calibration of models for manufacturing processes that are subject to circuit layout proximity effects is performed, including optical proximity correction (OPC) model calibration. A target structure is produced using a layout and a manufacturing process. The target structure is illuminated and an electromagnetic scattering property is detected. A manufacturing process model for simulation of the manufacturing process is produced, which comprises at least one manufacturing process parameter determining a model electromagnetic scattering property using the manufacturing process model and the layout. The model electromagnetic scattering property is compared to the detected electromagnetic scattering property and based on the result of the comparison, calibrated manufacturing process parameters are output for calibrating the manufacturing process model. The determining and the layout may include determining structural information corresponding to the target structure using the manufacturing process model and determining the model electromagnetic scattering property using the structural information.

    摘要翻译： 执行电路布局邻近效应的制造工艺模型的校准，包括光学邻近校正（OPC）模型校准。 使用布局和制造过程生产目标结构。 照射目标结构并检测电磁散射特性。 制造用于制造过程模拟的制造过程模型，其包括使用制造过程模型和布局来确定模型电磁散射性质的至少一个制造工艺参数。 将模型电磁散射特性与检测到的电磁散射特性进行比较，并根据比较结果，输出校准的制造工艺参数，以校准制造工艺模型。 确定和布局可以包括使用制造过程模型确定与目标结构相对应的结构信息，并且使用结构信息确定模型电磁散射特性。

    Data clearing methods and computer systems utilizing the same
    6.
    发明申请
    Data clearing methods and computer systems utilizing the same 审中-公开
    数据清算方法和利用其的计算机系统

    公开(公告)号：US20060288154A1

    公开(公告)日：2006-12-21

    申请号：US11211973

    申请日：2005-08-25

    申请人： Sin-Ru Huang ,  Jia-Han Li

    发明人： Sin-Ru Huang ,  Jia-Han Li

    IPC分类号： G06F13/28

    CPC分类号： G06F9/4403

    摘要： A data clearing method. When a computer system boots, a dynamic random access memory (DRAM) therein is cleared by way of suspending refresh cycles thereof within a predetermined period of time.

    摘要翻译： 数据清算方法。 当计算机系统引导时，其中的动态随机存取存储器（DRAM）通过在预定时间段内暂停其刷新周期而被清除。