公开(公告)号：US4995063A

公开(公告)日：1991-02-19

申请号：US466184

申请日：1990-01-17

申请人： Shigeo Enoki ,  Kenichi Okamura

发明人： Shigeo Enoki ,  Kenichi Okamura

IPC分类号： G01N23/20 ,  H01L21/66 ,  H01L21/67 ,  H01L21/68

CPC分类号： H01L21/68 ,  Y10S414/136 ,  Y10S414/137

摘要： A single crystal orientation identifying and determining apparatus for semiconductor wafers capable of conducting the facial discrimination of a semiconductor wafer and the determination of the crystal orientation thereof, which comprises a first wafer store; an alignment device for aligning the wafer in a predetermined orientation; an X-ray inspection device for inspecting the wafer as to whether or not the inspected face of the wafer is a predetermined particular face, and whether or not the orientation of the principal plane of the wafer is within a predetermined range, said X-ray detector, and X-ray detector, and an X-ray inspection stage; a second wafer store; a first conveyor for conveying the wafer from the first wafer store to the alignment device; a second conveyor for conveying the wafer form the alignment device to the X-ray inspection device, and a third conveyor for conveying the wafer from the X-ray inspection device to an arbitrary address in the second wafer store determined based on the result of the X-ray inspection and the wafer's address in the first wafer store.