Semiconductor wafer boat and vertical heat treating system
    1.
    发明授权
    Semiconductor wafer boat and vertical heat treating system 失效
    半导体晶圆舟和立式热处理系统

    公开(公告)号:US6095806A

    公开(公告)日:2000-08-01

    申请号:US337402

    申请日:1999-06-22

    摘要: A boat for semiconductor wafers includes first, second and third support rods arranged between and connected to top and bottom plates. The first, second and third support rods include a plurality of first racks, a plurality of second racks, and a plurality of third racks, respectively, such that the racks of each rods are vertically arrayed with gaps therebetween. The first, second and third racks serving to define a plurality of horizontal wafer supporting levels. Each wafer supporting level is defined by only combination of the first, second and third racks of the corresponding height. In each wafer supporting level, the first and second racks are arranged substantially in symmetry with respect to an axis passing through the center of a wafer transfer port, and the third rack is arranged deviant from the axis by a certain distance corresponding to 5% to 48% of the diameter of the wafer.

    摘要翻译: 用于半导体晶片的船包括布置在顶板和底板之间并连接到顶板和底板的第一,第二和第三支撑杆。 第一,第二和第三支撑杆分别包括多个第一机架,多个第二机架和多个第三机架,使得每个杆的齿条在其间具有间隙而垂直排列。 第一,第二和第三机架用于限定多个水平晶片支撑水平。 每个晶片支撑水平仅由对应高度的第一,第二和第三机架的组合限定。 在每个晶片支撑水平中,第一和第二机架相对于通过晶片传送端口的中心的轴线基本上对称布置,并且第三机架布置在与轴线偏离一定距离,对应于5%至 晶圆直径的48%。