公开(公告)号：US20200041428A1

公开(公告)日：2020-02-06

申请号：US16525198

申请日：2019-07-29

申请人： Sigray, Inc.

发明人： Wenbing Yun ,  Sylvia Jia Yun Lewis ,  Janos Kirz ,  David Vina

IPC分类号： G01N23/20 ,  G01N23/02

摘要： An x-ray source and an x-ray interferometry system utilizing the x-ray source are provided. The x-ray source includes a target that includes a substrate and a plurality of structures. The substrate includes a thermally conductive first material and a first surface. The plurality of structures is on or embedded in at least a portion of the first surface. The structures are separate from one another and are in thermal communication with the substrate. The structures include at least one second material different from the first material, the at least one second material configured to generate x-rays upon irradiation by electrons having energies in an energy range of 0.5 keV to 160 keV. The x-ray source further includes an electron source configured to generate the electrons and to direct the electrons to impinge the target and to irradiate at least some of the structures along a direction that is at a non-zero angle relative to a surface normal of the portion of the first surface. The x-ray source further includes at least one optical element positioned such that at least some of the x-rays are transmitted through the first material and to or through the at least one optical element.