HETEROJUNCTION SOLAR CELL BASED ON EPITAXIAL CRYSTALLINE-SILICON THIN FILM ON METALLURGICAL SILICON SUBSTRATE DESIGN
    1.
    发明申请
    HETEROJUNCTION SOLAR CELL BASED ON EPITAXIAL CRYSTALLINE-SILICON THIN FILM ON METALLURGICAL SILICON SUBSTRATE DESIGN 审中-公开
    基于金属硅基底板上的外延晶体硅薄膜的异相太阳能电池

    公开(公告)号:US20150040975A1

    公开(公告)日:2015-02-12

    申请号:US14525140

    申请日:2014-10-27

    Applicant: Silevo, Inc.

    Abstract: One embodiment of the present invention provides a heterojunction solar cell. The solar cell includes a metallurgical-grade Si (MG-Si) substrate, a layer of heavily doped crystalline-Si situated above the MG-Si substrate, a layer of lightly doped crystalline-Si situated above the heavily doped crystalline-Si layer, a backside ohmic-contact layer situated on the backside of the MG-Si substrate, a passivation layer situated above the heavily doped crystalline-Si layer, a layer of heavily doped amorphous Si (a-Si) situated above the passivation layer, a layer of transparent-conducting-oxide (TCO) situated above the heavily doped a-Si layer, and a front ohmic-contact electrode situated above the TCO layer.

    Abstract translation: 本发明的一个实施例提供了异质结太阳能电池。 太阳能电池包括冶金级Si(MG-Si)衬底,位于MG-Si衬底上方的重掺杂晶体层Si,位于重掺杂晶体Si层上方的轻掺杂晶体层Si, 位于MG-Si衬底背面的背面欧姆接触层,位于重掺杂晶体Si层上方的钝化层,位于钝化层上方的重掺杂非晶Si层(a-Si)层, 位于重掺杂的a-Si层上方的透明导电氧化物(TCO)和位于TCO层上方的前欧姆接触电极。

    Heterojunction solar cell based on epitaxial crystalline-silicon thin film on metallurgical silicon substrate design
    2.
    发明授权
    Heterojunction solar cell based on epitaxial crystalline-silicon thin film on metallurgical silicon substrate design 有权
    异质结太阳能电池基于外延晶体硅薄膜在冶金硅基板上的设计

    公开(公告)号:US08872020B2

    公开(公告)日:2014-10-28

    申请号:US13626740

    申请日:2012-09-25

    Applicant: Silevo, Inc.

    Abstract: One embodiment of the present invention provides a heterojunction solar cell. The solar cell includes a metallurgical-grade Si (MG-Si) substrate, a layer of heavily doped crystalline-Si situated above the MG-Si substrate, a layer of lightly doped crystalline-Si situated above the heavily doped crystalline-Si layer, a backside ohmic-contact layer situated on the backside of the MG-Si substrate, a passivation layer situated above the heavily doped crystalline-Si layer, a layer of heavily doped amorphous Si (a-Si) situated above the passivation layer, a layer of transparent-conducting-oxide (TCO) situated above the heavily doped a-Si layer, and a front ohmic-contact electrode situated above the TCO layer.

    Abstract translation: 本发明的一个实施例提供了异质结太阳能电池。 太阳能电池包括冶金级Si(MG-Si)衬底,位于MG-Si衬底上方的重掺杂晶体层Si,位于重掺杂晶体Si层上方的轻掺杂晶体层Si, 位于MG-Si衬底背面的背面欧姆接触层,位于重掺杂晶体Si层上方的钝化层,位于钝化层上方的重掺杂非晶Si层(a-Si)层, 位于重掺杂的a-Si层上方的透明导电氧化物(TCO)和位于TCO层上方的前欧姆接触电极。

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