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公开(公告)号:US20160194782A1
公开(公告)日:2016-07-07
申请号:US15070610
申请日:2016-03-15
发明人: Sung-Lin Hsu , Cheng-Jui Yang , Pei-Kai Huang , Sheng-Hua Ni , Yu-Min Yang , Ming-Kung Hsiao , Wen-Huai Yu , Ching-Shan Lin , Wen-Ching Hsu , Chung-Wen Lan
CPC分类号: C30B11/006 , C01B33/02 , C30B9/00 , C30B11/002 , C30B11/003 , C30B11/02 , C30B11/14 , C30B28/06 , C30B29/06
摘要: A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm.
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公开(公告)号:US10138572B2
公开(公告)日:2018-11-27
申请号:US15070610
申请日:2016-03-15
发明人: Sung-Lin Hsu , Cheng-Jui Yang , Pei-Kai Huang , Sheng-Hua Ni , Yu-Min Yang , Ming-Kung Hsiao , Wen-Huai Yu , Ching-Shan Lin , Wen-Ching Hsu , Chung-Wen Lan
摘要: A crystalline silicon ingot and a method of fabricating the same are disclosed. The crystalline silicon ingot of the invention includes multiple silicon crystal grains growing in a vertical direction of the crystalline silicon ingot. The crystalline silicon ingot has a bottom with a silicon crystal grain having a first average crystal grain size of less than about 12 mm. The crystalline silicon ingot has an upper portion, which is about 250 mm away from said bottom, with a silicon crystal grain having a second average crystal grain size of greater than about 14 mm.
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