公开(公告)号：US07405402B1

公开(公告)日：2008-07-29

申请号：US11360930

申请日：2006-02-22

申请人： Srinivas Vedula ,  Amir Azordegan ,  Laurence Hordon ,  Alan D. Brodie ,  Gian Francesco Lorusso ,  Takuji Tada

发明人： Srinivas Vedula ,  Amir Azordegan ,  Laurence Hordon ,  Alan D. Brodie ,  Gian Francesco Lorusso ,  Takuji Tada

IPC分类号： G01N23/00 ,  G21K7/00 ,  H01J3/14

CPC分类号： G01N23/04 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/0492 ,  H01J2237/153 ,  H01J2237/2817

摘要： One embodiment relates to an electron beam apparatus for automated imaging of a substrate surface. An electron source is configured to emit electrons, and a gun lens is configured to focus the electrons emitted by the electron source so as to form an electron beam. A condenser lens system is configured to receive the electron beam and to reduce its numerical aperture to an ultra-low numerical aperture. An objective lens is configured to focus the ultra-low numerical aperture beam onto the substrate surface. Other embodiments are also disclosed.

摘要翻译： 一个实施例涉及用于衬底表面的自动成像的电子束装置。 电子源被配置为发射电子，并且枪形透镜被配置为聚焦由电子源发射的电子以形成电子束。 聚光透镜系统被配置为接收电子束并且将其数值孔径减小到超低数值孔径。 物镜被配置为将超低数值孔径光束聚焦到衬底表面上。 还公开了其他实施例。