公开(公告)号：US20240234082A1

公开(公告)日：2024-07-11

申请号：US18618285

申请日：2024-03-27

Applicant: LightVision Inc.

Inventor： Jin Ha JEONG ,  Moon Soo RA ,  Hea Yun LEE ,  Hyun Ji LEE

IPC: H01J37/22 ,  H01J37/04 ,  H01J37/26

CPC classification number: H01J37/22 ,  H01J37/04 ,  H01J37/26 ,  H01J2237/153 ,  H01J2237/24585

Abstract: A system and a method of generating adaptively a TEM SADP image with high discernment according to inputted parameters are disclosed. The system for generating a diffraction pattern image includes a sample generating unit configured to generate a sample by using at least one of a parameter about a lattice constant, a parameter about relative location of atom in unit lattice and a parameter about a zone axis, a vector generating unit configured to generate a reciprocal lattice vector corresponding to the unit lattice, a light source generating unit configured to calculate brightness of an electron beam reached to atom in the generated sample and a diffraction pattern generating unit configured to generate synthetic diffraction pattern image by using the generated reciprocal lattice vector, the relative location of atom in the sample and the calculated brightness of the electron beam.

公开(公告)号：US11830705B2

公开(公告)日：2023-11-28

申请号：US17222431

申请日：2021-04-05

Applicant: PIE Scientific LLC

Inventor： Ximan Jiang

IPC: H01J37/32 ,  H01J37/317

CPC classification number: H01J37/32706 ,  H01J37/32357 ,  H01J37/32871 ,  H01J37/3174 ,  H01J2237/153 ,  H01J2237/184

Abstract: A method for altering surface charge on an insulating surface of a first sample includes generating first plasma inside a plasma source, causing the first plasma to diffuse into a first vacuum chamber to generate second downstream plasma, immersing the first sample in the second downstream plasma, and applying a first bias voltage to a conductive layer of the first sample, or applying a first bias voltage to a metal holder that holds the first sample.

公开(公告)号：US11664187B2

公开(公告)日：2023-05-30

申请号：US17344134

申请日：2021-06-10

Applicant: Intel Corporation

Inventor： Amir Raveh ,  Gideon Reisfeld ,  Patrick Pardy

IPC: H01J37/304 ,  H01J37/153 ,  H01J37/12 ,  H01J37/14 ,  G02B26/08 ,  H01J37/244 ,  H01J37/28 ,  H01J37/305 ,  H01J37/317

CPC classification number: H01J37/153 ,  G02B26/0816 ,  H01J37/12 ,  H01J37/14 ,  H01J37/244 ,  H01J37/304 ,  H01J37/28 ,  H01J37/3053 ,  H01J37/3174 ,  H01J2237/153 ,  H01J2237/24585

Abstract: An apparatus comprising a beam emitter to emit a beam comprising electrons, ions or laser-light photons toward a target substrate. A motion sensor to detect mechanical vibrations of the target substrate. The motion sensor is mechanically coupled to the target substrate, a processor coupled to an output of the motion sensor. The processor is to generate a vibration correction signal proportional to the mechanical vibrations detected by the motion sensor, and beam steering optics coupled to the processor. The beam steering optics are to deflect the beam according to the vibration correction signal to compensate for the mechanical vibrations of the target substrate.

公开(公告)号：US09916962B2

公开(公告)日：2018-03-13

申请号：US15466333

申请日：2017-03-22

Applicant: NuFlare Technology, Inc.

Inventor： Shinsuke Nishimura ,  Munehiro Ogasawara ,  Takanao Touya ,  Hirofumi Morita

IPC: H01J37/153 ,  H01J37/141 ,  H01J37/317 ,  H01J37/04 ,  H01J37/147

CPC classification number: H01J37/153 ,  H01J37/045 ,  H01J37/141 ,  H01J37/1472 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0437 ,  H01J2237/0492 ,  H01J2237/153

Abstract: A multi charged particle beam irradiation apparatus includes a shaping aperture array substrate, where plural openings are formed as an aperture array, to shape multi-beams by making a region including entire plural openings irradiated by a charged particle beam, and making portions of a charged particle beam individually pass through a corresponding one of the plural openings; and a plurality of stages of lenses, arranged such that a reduction ratio of multi-beams by at least one lens of a stage before the last stage lens is larger than that of the multi-beams by the last stage lens, to correct distortion of a formed image obtained by forming an image of the aperture array by the multi-beams, and to form the image of the aperture array by the multi-beams at a height position between the last stage lens and a last-but-one stage lens, and at the surface of a target object.

公开(公告)号：US20180040453A1

公开(公告)日：2018-02-08

申请号：US15665839

申请日：2017-08-01

Applicant: NuFlare Technology, Inc.

Inventor： Tsubasa NANAO ,  Yukitaka Shimizu

IPC: H01J37/09 ,  H01J37/304 ,  H01J37/20 ,  H01J37/317 ,  H01J37/04

CPC classification number: H01J37/09 ,  H01J37/045 ,  H01J37/20 ,  H01J37/304 ,  H01J37/3177 ,  H01J2237/043 ,  H01J2237/153 ,  H01J2237/24475 ,  H01J2237/30472

Abstract: In one embodiment, a multi charged particle beam writing apparatus includes an emitter that emits a charged particle beam, an aperture plate in which a plurality of openings are formed and that forms multiple beams by allowing the charged particle beam to pass through the plurality of openings, a blanking plate provided with a plurality of blankers that each perform blanking deflection on a corresponding beam included in the multiple beams, a stage on which a substrate irradiated with the multiple beams, a detector that detects a reflection charged particle from the substrate, feature amount calculation circuitry that calculates a feature amount of an aperture image based on a detection value of the detector, and aberration correction circuitry that corrects aberration of the charged particle beam based on the feature amount.

公开(公告)号：US09653257B2

公开(公告)日：2017-05-16

申请号：US15058062

申请日：2016-03-01

Applicant: KLA-Tencor Corporation

Inventor： Christopher Sears ,  Ben Clarke

IPC: H01J37/28 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/265 ,  H01J2237/004 ,  H01J2237/153 ,  H01J2237/226

Abstract: A scanning electron microscopy system for mitigating charging artifacts includes a scanning electron microscopy sub-system for acquiring multiple images from a sample. The images include one or more sets of complementary images. The one or more sets of complementary images include a first image acquired along a first scan direction and a second image acquired along a second scan direction opposite to the first scan direction. The system includes a controller communicatively coupled to the scanning electron microscopy sub-system. The controller is configured to receive images of the sample from the scanning electron microscopy sub-system. The controller is further configured to generate a composite image by combining the one or more sets of complementary images.

公开(公告)号：US20160041064A1

公开(公告)日：2016-02-11

申请号：US14706308

申请日：2015-05-07

Applicant: JEOL Ltd.

Inventor： Shigeyuki Morishita

IPC: G01M11/02 ,  H01J37/26

CPC classification number: H01J37/26 ,  G01M11/0257 ,  G01M11/0292 ,  H01J37/153 ,  H01J37/295 ,  H01J2237/153 ,  H01J2237/1532 ,  H01J2237/282

Abstract: An aberration computing device (100) includes a fitting section (48) for fitting line profiles of a diffractogram taken in radial directions to a fitting function and finding fitting parameters of the fitting function and a computing section (49) for finding at least one of an amount of defocus and two-fold astigmatism, based on the fitting parameters.

Abstract translation: 像差计算装置（100）包括：装配部分（48），用于将沿径向取向的衍射图的线轮廓拟合成拟合函数，并找到拟合函数的拟合参数;以及计算部分（49），用于找到 基于拟合参数的散焦量和双重散光量。

公开(公告)号：US08373136B2

公开(公告)日：2013-02-12

申请号：US12579869

申请日：2009-10-15

Applicant: Gerald Schoenecker ,  Stefan Lanio

Inventor： Gerald Schoenecker ,  Stefan Lanio

IPC: H01J3/18 ,  H01J3/20

CPC classification number: H01J37/1472 ,  H01J2237/1508 ,  H01J2237/153

Abstract: An achromatic beam separator device for separating a primary charged particle beam from another charged particle beam and providing the primary charged particle beam on an optical axis (142) is provided, including a primary charged particle beam inlet (134), a primary charged particle beam outlet (132) encompassing the optical axis, a magnetic deflection element (163) adapted to generate a magnetic field, and an electrostatic deflection element (165) adapted to generate an electric field overlapping the magnetic field, wherein at least one element chosen from the electrostatic deflection element and the magnetic deflection element is positioned and/or positionable to compensate an octopole influence.

Abstract translation: 提供了一种消色差束分离器装置，用于将初级带电粒子束与另一带电粒子束分离并在光轴（142）上提供初级带电粒子束，包括初级带电粒子束入口（134），初级带电粒子束 包括光轴的出口（132），适于产生磁场的磁偏转元件（163）和适于产生与磁场重叠的电场的静电偏转元件（165），其中，从 静电偏转元件和磁偏转元件被定位和/或定位以补偿八极杆的影响。

公开(公告)号：US08354654B2

公开(公告)日：2013-01-15

申请号：US12661522

申请日：2010-03-18

Applicant: Jiong Chen

Inventor： Jiong Chen

IPC: H01J37/317

CPC classification number: H01J37/3171 ,  H01J49/00 ,  H01J2237/057 ,  H01J2237/1526 ,  H01J2237/153 ,  H01J2237/166 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01J2237/30472

Abstract: An ion implantation apparatus with multiple operating modes is disclosed. The ion implantation apparatus has an ion source and an ion extraction means for forming a converging beam on AMU-non-dispersive plane therefrom. The ion implantation apparatus includes magnetic scanner prior to a magnetic analyzer for scanning the beam on the non-dispersive plane, the magnetic analyzer for selecting ions with specific mass-to-charge ratio to pass through a mass slit to project onto a substrate. A rectangular quadruple magnet is provided to collimate the scanned ion beam and fine corrections of the beam incident angles onto a target. A deceleration or acceleration system incorporating energy filtering is at downstream of the beam collimator. A two-dimensional mechanical scanning system for scanning the target is disclosed, in which a beam diagnostic means is built in.

Abstract translation: 公开了一种具有多种工作模式的离子注入装置。 离子注入装置具有离子源和用于在其AMU非分散平面上形成会聚束的离子提取装置。 离子注入装置包括在用于扫描非分散平面上的束的磁分析仪之前的磁扫描器，用于选择具有特定质荷比的离子的磁分析器通过质量狭缝以投射到基底上。 提供矩形四极磁体以准直扫描的离子束并将光束入射角精细校正到目标上。 结合能量过滤的减速或加速系统位于射束准直仪的下游。 公开了一种用于扫描目标的二维机械扫描系统，其中内置了光束诊断装置。

公开(公告)号：US08124946B2

公开(公告)日：2012-02-28

申请号：US12477631

申请日：2009-06-03

Applicant: Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

Inventor： Geoffrey Ryding ,  Theodore Smick ,  Marvin Farley ,  Takao Sakase ,  Bo Vanderberg

IPC: H01J37/317 ,  H01J49/30 ,  H01J49/42

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J2237/0492 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1501 ,  H01J2237/1523 ,  H01J2237/153 ,  H01J2237/21 ,  H01J2237/24528 ,  H01J2237/31705

Abstract: A system and method for magnetically filtering an ion beam during an ion implantation into a workpiece is provided, wherein ions are emitted from an ion source and accelerated the ions away from the ion source to form an ion beam. The ion beam is mass analyzed by a mass analyzer, wherein ions are selected. The ion beam is then decelerated via a decelerator once the ion beam is mass-analyzed, and the ion beam is further magnetically filtered the ion beam downstream of the deceleration. The magnetic filtering is provided by a quadrapole magnetic energy filter, wherein a magnetic field is formed for intercepting the ions in the ion beam exiting the decelerator to selectively filter undesirable ions and fast neutrals.

Abstract translation: 提供了一种用于在离子注入工件期间对离子束进行磁过滤的系统和方法，其中离子从离子源发射并且将离子加速离开离子源以形成离子束。 离子束通过质量分析器进行质量分析，其中选择离子。 一旦离子束被质量分析，离子束然后通过减速器减速，并且离子束进一步对减速度下游的离子束进行磁过滤。 磁滤波由四极磁能滤波器提供，其中形成磁场以截取离开减速器的离子束中的离子，以选择性地过滤不需要的离子和快速中性粒子。