Removal of Trace Arsenic Impurities from Triethylphosphate (TEPO)
    1.
    发明申请
    Removal of Trace Arsenic Impurities from Triethylphosphate (TEPO) 失效
    从三乙基磷酸盐(TEPO)去除痕量砷杂质

    公开(公告)号:US20100018849A1

    公开(公告)日:2010-01-28

    申请号:US12179979

    申请日:2008-07-25

    IPC分类号: B01D3/34

    CPC分类号: C07F9/11 C07F9/025

    摘要: A method of removing trace levels of arsenic-containing impurities from raw triethylphosphate (TEPO) is disclosed. The method uses adsorption, or adsorption followed by a flash distillation. The method comprises contacting raw triethylphosphate (TEPO) with an adsorbent which selectively adsorbs the arsenic-containing impurities in the raw triethylphosphate (TEPO). The adsorbent is a base promoted alumina containing adsorbent represented by a formula: ZxWy; where x is the weight percentage of Z in the adsorbent ranging from 30% to 99.999%; y is the weight percentage of W in the adsorbent, and x+y=100%; Z is selected from the group consisting of alumina (Al2O3), magnesium-alumina based layered double hydroxide (MgO—Al2O3), alumina-zeolite, and mixtures thereof; and W is selected from the group consisting of at least one basic metal oxide, at least one basic metal carbonate, and mixtures thereof. The method will result in a final triethylphosphate (TEPO) with a few ppb to less than 1 ppb arsenic containing impurities.

    摘要翻译: 公开了从原料三乙基磷酸盐(TEPO)中除去痕量砷含量杂质的方法。 该方法使用吸附或吸附,然后进行快速蒸馏。 该方法包括将原料三乙基磷酸盐(TEPO)与选择性吸附原料三乙基磷酸盐(TEPO)中的含砷杂质的吸附剂接触。 吸附剂是由式ZxWy表示的碱性促进氧化铝的吸附剂。 其中x是吸附剂中Z的重量百分数,范围为30%至99.999%; y是吸附剂中W的重量百分数,x + y = 100%; Z选自氧化铝(Al2O3),镁 - 氧化铝基层状双氢氧化物(MgO-Al 2 O 3),氧化铝 - 沸石及其混合物; W选自至少一种碱金属氧化物,至少一种碱金属碳酸盐及其混合物。 该方法将产生具有几ppb至少于1ppb含砷杂质的最终三乙基磷酸酯(TEPO)。

    Removal of trace arsenic impurities from triethylphosphate (TEPO)
    2.
    发明授权
    Removal of trace arsenic impurities from triethylphosphate (TEPO) 失效
    从磷酸三乙酯(TEPO)去除痕量砷杂质

    公开(公告)号:US08039658B2

    公开(公告)日:2011-10-18

    申请号:US12179979

    申请日:2008-07-25

    IPC分类号: C07F9/09

    CPC分类号: C07F9/11 C07F9/025

    摘要: A method of removing trace levels of arsenic-containing impurities from raw triethylphosphate (TEPO) is disclosed. The method uses adsorption, or adsorption followed by a flash distillation. The method comprises contacting raw triethylphosphate (TEPO) with an adsorbent which selectively adsorbs the arsenic-containing impurities in the raw triethylphosphate (TEPO). The adsorbent is a base promoted alumina containing adsorbent represented by a formula: ZxWy; where x is the weight percentage of Z in the adsorbent ranging from 30% to 99.999%; y is the weight percentage of W in the adsorbent, and x+y=100%; Z is selected from the group consisting of alumina (Al2O3), magnesium-alumina based layered double hydroxide (MgO—Al2O3), alumina-zeolite, and mixtures thereof; and W is selected from the group consisting of at least one basic metal oxide, at least one basic metal carbonate, and mixtures thereof. The method will result in a final triethylphosphate (TEPO) with a few ppb to less than 1 ppb arsenic containing impurities.

    摘要翻译: 公开了从原料三乙基磷酸盐(TEPO)中除去痕量砷含量杂质的方法。 该方法使用吸附或吸附,然后进行快速蒸馏。 该方法包括将原料三乙基磷酸盐(TEPO)与选择性吸附原料三乙基磷酸盐(TEPO)中的含砷杂质的吸附剂接触。 吸附剂是由式ZxWy表示的碱性促进氧化铝的吸附剂。 其中x是吸附剂中Z的重量百分数,范围为30%至99.999%; y是吸附剂中W的重量百分数,x + y = 100%; Z选自氧化铝(Al2O3),镁 - 氧化铝基层状双氢氧化物(MgO-Al 2 O 3),氧化铝 - 沸石及其混合物; W选自至少一种碱金属氧化物,至少一种碱金属碳酸盐及其混合物。 该方法将产生具有几ppb至少于1ppb含砷杂质的最终三乙基磷酸酯(TEPO)。

    Stabilizers for the Stabilization of Unsaturated Hydrocarbon-Based Precursor
    3.
    发明申请
    Stabilizers for the Stabilization of Unsaturated Hydrocarbon-Based Precursor 有权
    用于稳定不饱和烃基前体的稳定剂

    公开(公告)号:US20110218371A1

    公开(公告)日:2011-09-08

    申请号:US13109488

    申请日:2011-05-17

    IPC分类号: C07C7/20

    摘要: A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, and a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer. A method for stabilizing unsaturated hydrocarbon-based precursor material against the polymerization comprises providing a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.

    摘要翻译: 稳定化的组合物基本上由不饱和烃基材料和选自羟基二苯甲酮和基于硝酰基的稳定剂组成的组中的稳定剂组成。 稳定不饱和烃基前体材料以抗聚合的方法包括提供选自羟基二苯甲酮和基于硝酰基的稳定剂的稳定剂。

    Stabilizers for the Stabilization of Unsaturated Hydrocarbon-based Precursor
    4.
    发明申请
    Stabilizers for the Stabilization of Unsaturated Hydrocarbon-based Precursor 有权
    用于稳定不饱和烃基前体的稳定剂

    公开(公告)号:US20090159843A1

    公开(公告)日:2009-06-25

    申请号:US12038409

    申请日:2008-02-27

    IPC分类号: C09K3/00

    摘要: A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, and a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, at least one polar liquid and a stabilizer selected from the group consisting of a hydroxybenzophenone, a nitroxyl radical based stabilizer and a hydroquinone based stabilizer.A method for stabilizing unsaturated hydrocarbon-based precursor material against the polymerization comprises providing a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.A method for stabilizing a mixture of unsaturated hydrocarbon-based precursor material with at lease one polar liquid against the polymerization comprises adding to the mixture, a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.

    摘要翻译: 稳定化的组合物基本上由不饱和烃基材料和选自羟基二苯甲酮和基于硝酰基的稳定剂组成的组中的稳定剂组成。 稳定化的组合物基本上由不饱和烃基材料,至少一种极性液体和选自羟基二苯甲酮,基于硝酰基的稳定剂和氢醌基稳定剂的稳定剂组成。 稳定不饱和烃基前体材料以抗聚合的方法包括提供选自羟基二苯甲酮和基于硝酰基的稳定剂的稳定剂。 用于使不饱和烃类前体材料与至少一种极性液体的混合物与聚合反应的方法包括向混合物中加入选自羟基二苯甲酮和基于硝酰基的稳定剂的稳定剂。

    Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor
    8.
    发明授权
    Stabilizers for the stabilization of unsaturated hydrocarbon-based precursor 有权
    用于稳定不饱和烃类前体的稳定剂

    公开(公告)号:US08440099B2

    公开(公告)日:2013-05-14

    申请号:US12128381

    申请日:2008-05-28

    IPC分类号: C09K3/00 C09K15/20

    摘要: A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, and a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, at least one polar liquid and a stabilizer selected from the group consisting of a hydroxybenzophenone, a nitroxyl radical based stabilizer and a hydroquinone based stabilizer.A method for stabilizing unsaturated hydrocarbon-based precursor material against the polymerization comprises providing a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.A method for stabilizing a mixture of unsaturated hydrocarbon-based precursor material with at lease one polar liquid against the polymerization comprises adding to the mixture, a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.

    摘要翻译: 稳定化的组合物基本上由不饱和烃基材料和选自羟基二苯甲酮和基于硝酰基的稳定剂组成的组中的稳定剂组成。 稳定化的组合物基本上由不饱和烃基材料,至少一种极性液体和选自羟基二苯甲酮,基于硝酰基的稳定剂和氢醌基稳定剂的稳定剂组成。 稳定不饱和烃基前体材料以抗聚合的方法包括提供选自羟基二苯甲酮和基于硝酰基的稳定剂的稳定剂。 用于使不饱和烃类前体材料与至少一种极性液体的混合物与聚合反应的方法包括向混合物中加入选自羟基二苯甲酮和基于硝酰基的稳定剂的稳定剂。

    Low-impurity organosilicon product as precursor for CVD
    9.
    发明授权
    Low-impurity organosilicon product as precursor for CVD 有权
    低杂质有机硅产品作为CVD的前体

    公开(公告)号:US08329933B2

    公开(公告)日:2012-12-11

    申请号:US13205015

    申请日:2011-08-08

    IPC分类号: C07F7/04

    CPC分类号: C07F7/20 C07F7/1804

    摘要: The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.

    摘要翻译: 本发明提供一种包含二乙氧基甲基硅烷的有机硅组合物,溶解的残留氯化物的浓度以及溶解的残余氯化物清除剂的浓度,当与包含二乙氧基甲基硅烷的另一种组合物组合时,其不产生不需要的氯化物盐沉淀物。