公开(公告)号：US20080042105A1

公开(公告)日：2008-02-21

申请号：US11872221

申请日：2007-10-15

申请人： Steven Mayorga ,  Manchao Xiao ,  Thomas Gaffney ,  Robert Syvret

发明人： Steven Mayorga ,  Manchao Xiao ,  Thomas Gaffney ,  Robert Syvret

IPC分类号： C09K15/32

CPC分类号： C07F7/21 ,  C07F7/089 ,  C07F7/20 ,  C23C16/401 ,  C23C16/4402

摘要： The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of an antioxidant polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and an antioxidant.

摘要翻译： 本发明是 （a）用于稳定环四硅氧烷（例如1,3,5,7-四甲基环四硅氧烷）的方法，用于电子材料制造中用于氧化硅的化学气相沉积工艺中的聚合，包括向其提供有效量的抗氧化聚合抑制剂 环四硅氧烷; 和（b）在电子材料制造中作为氧化硅前体的化学气相沉积方法中使用的稳定的聚合的1,3,5,7-四甲基环四硅氧烷的环四硅氧烷的组合物，包括： 这种环四硅氧烷和抗氧化剂。

公开(公告)号：US20060252904A1

公开(公告)日：2006-11-09

申请号：US11484094

申请日：2006-07-11

申请人： Steven Mayorga ,  Manchao Xiao ,  Thomas Gaffney ,  Robert Syvret

发明人： Steven Mayorga ,  Manchao Xiao ,  Thomas Gaffney ,  Robert Syvret

IPC分类号： C23C16/00

CPC分类号： C23C16/401 ,  C07F7/20 ,  C07F7/21 ,  C08K5/13 ,  C09D4/00 ,  H01L21/02164 ,  H01L21/02271 ,  H01L21/31608 ,  C08G77/04

摘要： The present invention is; (a) a process for stabilizing a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, against polymerization used in a chemical vapor deposition process for silicon oxides in electronic material fabrication comprising providing an effective amount of a free radical scavenger polymerization inhibitor to such cyclotetrasiloxane; and (b) a composition of a cyclotetrasiloxane, such as 1,3,5,7-tetramethylcyclotetrasiloxane, stabilized against polymerization used in a chemical vapor deposition process as a precursor for silicon oxides in electronic material fabrication, comprising; such cyclotetrasiloxane and a free radical scavenger polymerization inhibitor.

公开(公告)号：US20080026319A1

公开(公告)日：2008-01-31

申请号：US11763149

申请日：2007-06-14

申请人： Lawrence Stroh ,  Thomas Gaffney

发明人： Lawrence Stroh ,  Thomas Gaffney

IPC分类号： G03C1/00

CPC分类号： B41M5/26 ,  B41M5/262 ,  B41M5/267

摘要： A method of marking a coating includes incorporating into a powder coating composition a laser-reactive material; forming a coating layer on an article with the coating composition, and marking the coating on the article with a laser. The marking can be printing, a graphic, a design, a log, information, symbols, and so on, as well as combinations of such markings.

摘要翻译： 标记涂层的方法包括将粉末涂料组合物掺入激光反应性材料中; 在具有涂料组合物的物品上形成涂层，并用激光将涂层标记在物品上。 标记可以是打印，图形，设计，日志，信息，符号等，以及这些标记的组合。