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公开(公告)号：US20230326772A1
公开(公告)日：2023-10-12
申请号：US18332261
申请日：2023-06-09
发明人： Yu-Cheng CHANG , Keng-Hui PAN , Chieh-Jan HUANG , Ming-Lee LEE , Chiang-Jeh CHEN
IPC分类号： H01L21/67 , H01L21/02 , H01L21/306
CPC分类号： H01L21/67253 , H01L21/02008 , H01L21/67294 , H01L21/6715 , H01L21/306
摘要： A method includes moving a drum containing a chemical liquid into a chamber of a chemical liquid supplying system. The drum is connected with a testing pipe. The chemical liquid is pumped from the drum to the testing pipe. A condition of the chemical liquid flowing through the testing pipe is monitored. Whether the chemical liquid is supplied to a processing tool is determined based on the condition of the chemical liquid.
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公开(公告)号：US20210202285A1
公开(公告)日：2021-07-01
申请号：US16837507
申请日：2020-04-01
发明人： Yu-Cheng CHANG , Keng-Hui PAN , Chieh-Jan HUANG , Ming-Lee LEE , Chiang-Jeh CHEN
IPC分类号： H01L21/67 , H01L21/02 , H01L21/306
摘要： In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.
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