公开(公告)号：US20210202284A1

公开(公告)日：2021-07-01

申请号：US17100218

申请日：2020-11-20

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Tzu-Yang LIN ,  Cheng-Han WU ,  Chen-Yu LIU ,  Kuo-Shu TSENG ,  Shang-Sheng LI ,  Chen Yi HSU ,  Yu-Cheng CHANG

IPC分类号： H01L21/67

摘要： A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.

公开(公告)号：US20230326772A1

公开(公告)日：2023-10-12

申请号：US18332261

申请日：2023-06-09

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Yu-Cheng CHANG ,  Keng-Hui PAN ,  Chieh-Jan HUANG ,  Ming-Lee LEE ,  Chiang-Jeh CHEN

IPC分类号： H01L21/67 ,  H01L21/02 ,  H01L21/306

CPC分类号： H01L21/67253 ,  H01L21/02008 ,  H01L21/67294 ,  H01L21/6715 ,  H01L21/306

摘要： A method includes moving a drum containing a chemical liquid into a chamber of a chemical liquid supplying system. The drum is connected with a testing pipe. The chemical liquid is pumped from the drum to the testing pipe. A condition of the chemical liquid flowing through the testing pipe is monitored. Whether the chemical liquid is supplied to a processing tool is determined based on the condition of the chemical liquid.

公开(公告)号：US20210202285A1

公开(公告)日：2021-07-01

申请号：US16837507

申请日：2020-04-01

申请人： TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.

发明人： Yu-Cheng CHANG ,  Keng-Hui PAN ,  Chieh-Jan HUANG ,  Ming-Lee LEE ,  Chiang-Jeh CHEN

IPC分类号： H01L21/67 ,  H01L21/02 ,  H01L21/306

摘要： In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.