公开(公告)号：US20210408062A1

公开(公告)日：2021-12-30

申请号：US16757400

申请日：2020-01-07

Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Fen LONG

IPC: H01L27/12 ,  H01L29/786

Abstract: The present invention provides a thin-film transistor (TFT) array substrate and a manufacturing method thereof. The manufacturing method uses a four-mask process that uses an etch-stop layer on a semiconductor layer as a mask to perform alignment and etching to form a pattern of an amorphous silicon island. Tail fibers exposed outside of a source and a drain are removed, photoelectric sensitivity of a TFT device can be effectively reduced, and size of the TFT device is reduced, which can simplify processes, save layout space, and effectively increase display quality of large-size and high-resolution liquid crystal panels under high backlight intensity.

公开(公告)号：US20240027862A1

公开(公告)日：2024-01-25

申请号：US17614389

申请日：2021-11-05

Applicant: TCL China Star Optoelectronics Technology Co., Ltd.

Inventor： Juncheng XIAO ,  Ji LI ,  Fen LONG ,  Yingchun ZHAO ,  Ru GE

IPC: G02F1/1368 ,  G02F1/1362 ,  G02F1/1343

CPC classification number: G02F1/1368 ,  G02F1/136286 ,  G02F1/134309

Abstract: The present application relates to an array substrate and a display panel. In the present application, a first common line and a first sharing line are respectively disposed on two sides of a scan line, thereby preventing a situation in the prior art that the first sharing line penetrates a main pixel region and a sub-pixel region vertically, thereby improving an aperture ratio and a transmittance of the array substrate. The first common line, the first sharing line, and the scan line are disposed in a same layer, thereby further improving the transmittance of the array substrate.

公开(公告)号：US20210408069A1

公开(公告)日：2021-12-30

申请号：US16757420

申请日：2020-01-13

Applicant: TCL CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.

Inventor： Fen LONG

IPC: H01L27/12

Abstract: The present disclosure provides a TFT array substrate and a manufacturing method thereof. For the manufacturing method, a source electrode and a drain electrode are formed at first, and then edges of the source electrode and the drain electrode are used as masks to pattern a semiconductor layer to form an amorphous silicon island, which makes edges of the amorphous silicon island flush with the edges of the source electrode and the drain electrode, and completely removes the exposed semiconductor layer outside a metal layer, thereby decreasing photoelectric sensitivity of a TFT device, decreasing a size of the TFT device, and being beneficial for saving layouts and simplifying processes.

公开(公告)号：US20240028138A1

公开(公告)日：2024-01-25

申请号：US17614550

申请日：2021-10-27

Applicant: TCL China Star Optoelectronics Technology Co., Ltd.

Inventor： Ru GE ,  Fen LONG

IPC: G06F3/0354 ,  G06F3/042 ,  G06F3/038

CPC classification number: G06F3/03542 ,  G06F3/042 ,  G06F3/0383

Abstract: Embodiments of the present disclosure discloses a touch generator, an optical touch system, and a touch method. A force condition of a forced member is detected by a pressure detecting unit. When the forced member touches a display panel, the pressure detecting unit detects the force condition of the forced member and sends a control signal, a light-emitting unit receives the control signal and generates light, and the light emits to the display panel from the forced member, which can prevent false touch, simplify operation, and decrease a difficulty of using the touch generator.

公开(公告)号：US20240027856A1

公开(公告)日：2024-01-25

申请号：US17614394

申请日：2021-11-05

Applicant: TCL China Star Optoelectronics Technology Co., Ltd.

Inventor： Juncheng XIAO ,  Ji LI ,  Fen LONG ,  Yingchun ZHAO ,  Ru GE ,  Yun YU ,  Jing LIU

IPC: G02F1/1362 ,  G02F1/1368

CPC classification number: G02F1/136286 ,  G02F1/1368 ,  G02F1/13624

Abstract: The present application relates to an array substrate and a display panel. According to the present application, a first sharing line is correspondingly disposed under the data line, an electric field of the data line is shielded through the first sharing line, a coupling effect between the data line and a first common line is reduced through the first sharing line, a crosstalk caused to the data line due to fluctuation of the first common line is reduced, and a problem in the prior art of using a common electrode line to shield a lateral electric field of the data line, resulting in a low aperture ratio of a display panel, is prevented.