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公开(公告)号:US10566171B2
公开(公告)日:2020-02-18
申请号:US15123350
申请日:2016-03-25
Inventor: Zhixiong Yuan , Kazuya Goto , Toshiyuki Morimura , Takahiro Shimbo
IPC: H01J37/147 , B23K15/00 , H01J37/302 , B33Y30/00 , B22F3/105 , H01J37/21 , B33Y10/00 , B33Y50/02 , B29C64/153 , B29C64/393 , B29C64/268 , B29C64/205 , B23K15/02 , H01J37/10 , H01J37/305 , G21K1/08 , B29C64/10 , B29C64/20
Abstract: This invention can maintain the temperature of the shaping plane in a three-dimensional layer-by-layer shaping apparatus. A three-dimensional layer-by-layer shaping apparatus includes a material spreader that spreads the material or materials of a three-dimensional layer-by-layer shaped object onto the shaping plane on which the three-dimensional layer-by-layer shaped object is to be shaped; an electron gun that generates an electron beam; at least one deflector that deflects the electron beam so that it scans the shaping plane one- or two-dimensionally; at least one lens that is positioned between the electron gun and the deflector, and focuses the electron beam; a focus controller that controls the focus of the electron beam based on which region is to be scanned by the electron beam; and a controller that controls the deflecting direction of the deflector and the scanning rate.