X-ray lithography mask
    1.
    发明授权
    X-ray lithography mask 失效
    X射线光刻掩模

    公开(公告)号:US3873824A

    公开(公告)日:1975-03-25

    申请号:US40241973

    申请日:1973-10-01

    CPC classification number: G03F1/22 G21K1/10

    Abstract: The disclosure relates to a mask for use in X-ray lithography wherein a window is provided for X-rays, a pattern being placed over the window which absorbs the X-rays along the pattern, thereby providing a mask to the X-rays in accordance with the pattern and causing the X-rays to strike a mask on a device at all points except where the X-rays have been masked. Photoresist systems which are responsive to X-rays are well known, these including polymethylmethacrylate. The mask is formed from a thin layer of silicon carbide with a ring of material supporting the silicon carbide, preferably silicon. The desired pattern is then formed on the silicon carbide, using a material which absorbs Xrays, such as gold. The mask is formed by utilizing a starting substrate such as silicon and depositing a thin layer of silicon carbide thereon. The silicon is then etched down to the silicon carbide at all points except for the perimeter of the silicon carbide or in segments such as quadrants to provide a support for the silicon carbide. The silicon carbide is thin and acts as a window to Xrays. An X-ray absorbing mask is then formed on the silicon carbide window to provide the final X-ray lithograph mask.

    Abstract translation: 本公开涉及一种用于X射线光刻的掩模,其中为X射线提供窗口,图案放置在窗口上,沿着图案吸收X射线,从而为X射线提供掩模 根据该图案,并且使X射线在除了X射线被掩蔽之外的所有点处在设备上打开掩模。 对X射线敏感的光刻胶系统是众所周知的,包括聚甲基丙烯酸甲酯。 掩模由具有支撑碳化硅,优选硅的材料环的碳化硅薄层形成。 然后使用吸收X射线的材料(例如金)在碳化硅上形成所需的图案。

    Schottky barrier light sensitive storage device formed by random metal particles
    2.
    发明授权
    Schottky barrier light sensitive storage device formed by random metal particles 失效
    SCHOTTKY BARRIER轻质敏感存储器件由随机金属颗粒形成

    公开(公告)号:US3634692A

    公开(公告)日:1972-01-11

    申请号:US3634692D

    申请日:1968-07-03

    CPC classification number: H01J29/453 Y10S148/12 Y10S148/139 Y10S257/917

    Abstract: An electronic camera utilizing a solid-state light sensitive storage device comprised of a sheet of semiconductor material having a large number of very small electrically isolated metal spots on one surface of the sheet each forming a rectifying, capacitive junction of the type referred to as a Schottky barrier. An electron beam is scanned over a surface upon which the metal spots are formed to reverse bias and capacitively charge the rectifying junctions. A light image focused on the other side of the semiconductor slice discharges each discrete capacitor in proportion to the intensity of the light at the location of said discrete capacitor. The current required to recharge each capacitor as the electron beam is scanned produces an output voltage across a load resistance. The light sensitive storage device is fabricated by properly preparing the surface of the substrate and then evaporatively depositing a layer of the metal, e.g. platinum or gold, at a temperature such that the metal nucleates to form a very thin, discontinuous film having discrete electrically isolated microscopic globules.

    Abstract translation: 一种使用固态感光存储装置的电子照相机,其包括在片材的一个表面上具有大量非常小的电隔离金属斑点的半导体材料片,其各自形成称为“ 肖特基屏障。 在形成金属点的表面上扫描电子束以反向偏置并对整流结进行电容充电。 聚焦在半导体层的另一侧的光图像与所述分立电容器的位置处的光的强度成比例地排放每个分立的电容器。 电子束被扫描时对每个电容器充电所需的电流在负载电阻上产生输出电压。 通过适当地制备基材的表面,然后蒸发沉积金属层,例如制备光敏储存装置。 铂或金,使得金属成核以形成具有分立的电隔离微球的非常薄的不连续膜。

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