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公开(公告)号：US20190263961A1
公开(公告)日：2019-08-29
申请号：US16344599
申请日：2017-11-16
Applicant: TOKUYAMA CORPORATION
Inventor： Yasutomo SHIMIZU , Takayoshi KAWASAKI , Junji MOMODA , Mitsuki TOCHI
Abstract: To provide a urethane resin for sliding members which has high abrasion resistance and is considered that crosslinking points are uniformly dispersed so that molecular motion is suitably possible. Particularly, to provide the urethane resin can be advantageously used as a polishing pad.There is provided the urethane resin for polishing is obtained by polymerizing a polymerizable composition comprising (A) a polyrotaxane having a composite molecular structure formed by an axial molecule and a plurality of cyclic molecules clathrating the axial molecule and side chains having an active hydrogen group introduced into at least some of the cyclic molecules and (B) a polyiso(thio)cyanate compound.
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公开(公告)号：US20230211454A1
公开(公告)日：2023-07-06
申请号：US17927669
申请日：2021-05-27
Applicant: TOKUYAMA CORPORATION
Inventor： Yasutomo SHIMIZU , Takayoshi KAWASAKI , Junji MOMODA , Mitsuki TOCHI
Abstract: The CMP laminated polishing pad of the present invention includes at least a polishing layer and an under layer, wherein the under layer contains a resin obtained by polymerizing a polymerizable composition containing: (A) a polyrotaxane monomer having at least two polymerizable functional groups in a molecule; and (B) a polymerizable monomer other than the polyrotaxane monomer having at least two polymerizable functional groups in a molecule. According to the present invention, a polishing pad having not only good wear resistance but also excellent polishing characteristics (high polishing rate, low scratch property, and high flatness) can be provided.
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公开(公告)号：US20210155736A1
公开(公告)日：2021-05-27
申请号：US17045553
申请日：2019-04-08
Applicant: TOKUYAMA CORPORATION
Inventor： Yasutomo SHIMIZU , Takayoshi KAWASAKI , Mitsuki TOCHI
Abstract: The present invention relates to a urethane resin obtained by reacting a polymerizable composition containing at least a urethane prepolymer (B2) having an iso(thio)cyanate group at an end of a molecule thereof, which is obtained by reacting a bifunctional active hydrogen-containing compound (C1) having two groups having active hydrogen in a molecule thereof and a bifunctional iso(thio)cyanate group-containing compound (B1) having two iso(thio)cyanate groups in a molecule thereof, a polyrotaxane (A) having a composite molecular structure formed by an axial molecule and a plurality of cyclic molecules clathrating the axial molecule, in which side chains having a group having active hydrogen are introduced into at least a part of the cyclic molecules, and a polyfunctional active hydrogen-containing compound (C2) other than the polyrotaxane (A) and having three or more groups having active hydrogen in a molecule thereof. In accordance with the present invention, it is possible to provide a urethane resin for a sliding member with high abrasion resistance and capable of being suitably used as a polishing pad.
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4.发明申请公开(公告)号：US20210122874A1
公开(公告)日：2021-04-29
申请号：US17055270
申请日：2019-05-16
Applicant: TOKUYAMA CORPORATION
Inventor： Yasutomo SHIMIZU , Takayoshi KAWASAKI , Mitsuki TOCHI
IPC: C08G18/64 , C08G83/00 , C08F220/18 , C08K5/14 , C08K7/22 , C08K5/1545
Abstract: The invention is a polyrotaxane monomer (A) having a composite molecular structure composed of cyclic molecules and an axial molecule that skewer-like threads through the rings of the cyclic molecules and has a bulky group at both ends thereof so as not to dethread the rings, and the polyrotaxane monomer has a polymerizable functional group in the molecule and has a water content of 5000 ppm or less. According to the present invention, there can be provided a polyrotaxane monomer having a high productivity and capable of producing a high-quality material at a high yield, while maintaining excellent mechanical characteristics of the polyrotaxane monomer.
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