公开(公告)号：US20190276935A1

公开(公告)日：2019-09-12

申请号：US16426567

申请日：2019-05-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato YONEZAWA ,  Shigehiro MIURA ,  Hiroyuki AKAMA ,  Koji YOSHII

IPC: C23C16/46 ,  C23C16/458 ,  C23C16/52 ,  C23C16/455

Abstract: A film forming apparatus for performing a predetermine film forming process on a substrate mounted on an upper surface of a rotary table installed within a process vessel while rotating the rotary table and heating the substrate by a heating part, includes: a contact type first temperature measuring part configured to measure a temperature of the heating part; a non-contact type second temperature measuring part configured to measure a temperature of the substrate; and a control part configured to control a power supplied to the heating part based on at least one among a first measurement value measured by the first temperature measuring part and a second measurement value measured by the second temperature measuring part. The control part changes a method for controlling the power when the predetermined film forming process is performed on the substrate and when the substrate is loaded into or unloaded from the process vessel.

公开(公告)号：US20170051403A1

公开(公告)日：2017-02-23

申请号：US15240316

申请日：2016-08-18

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato YONEZAWA ,  Shigehiro MIURA ,  Hiroyuki AKAMA ,  Koji YOSHII

IPC: C23C16/455 ,  C23C16/46 ,  C23C16/52

CPC classification number: C23C16/46 ,  C23C16/45536 ,  C23C16/45551 ,  C23C16/4584 ,  C23C16/52

Abstract: A film forming apparatus for performing a predetermine film forming process on a substrate mounted on an upper surface of a rotary table installed within a process vessel while rotating the rotary table and heating the substrate by a heating part, includes: a contact type first temperature measuring part configured to measure a temperature of the heating part; a non-contact type second temperature measuring part configured to measure a temperature of the substrate; and a control part configured to control a power supplied to the heating part based on at least one among a first measurement value measured by the first temperature measuring part and a second measurement value measured by the second temperature measuring part. The control part changes a method for controlling the power when the predetermined film forming process is performed on the substrate and when the substrate is loaded into or unloaded from the process vessel.

Abstract translation: 一种成膜装置，用于在旋转所述旋转台并通过加热部加热所述基板的同时在安装在处理容器的旋转台的上表面上的基板上进行预定的成膜处理，所述成膜装置包括：接触型第一温度测量 被配置为测量加热部件的温度的部件; 非接触型第二温度测量部件，被配置为测量所述基板的温度; 以及控制部，其基于由所述第一温度测量部测量的第一测量值和由所述第二温度测量部测量的第二测量值中的至少一个来控​​制供应到所述加热部件的功率。 当在基板上执行预定的成膜处理时以及当将基板装载到处理容器中或从处理容器卸载时，控制部分改变用于控制功率的方法。