公开(公告)号：US11765879B2

公开(公告)日：2023-09-19

申请号：US16868843

申请日：2020-05-07

Applicant: Tokyo Electron Limited

Inventor： Junnosuke Taguchi

IPC: H01L21/67 ,  H10B12/00 ,  H01L27/02 ,  H01L21/68 ,  H10B20/00

CPC classification number: H10B12/01 ,  H01L21/67265 ,  H01L21/681 ,  H01L27/0288 ,  H10B20/00

Abstract: A substrate processing apparatus according to an aspect of the present disclosure includes a mounting section on which a substrate is placed, a structure member provided above the mounting section so as to face the mounting section, and an optical sensor. The optical sensor is configured to detect a height of the mounting section, a height of the structure member, and a height of the substrate, by emitting light from above the structure member to a predetermined location of the mounting section, a predetermined location of the structure member, and the substrate, and by receiving reflection light from the mounting section, the structure member, and the substrate.

公开(公告)号：US11670999B2

公开(公告)日：2023-06-06

申请号：US17387569

申请日：2021-07-28

Applicant: PROTERIAL, LTD. ,  Tokyo Electron Limited

Inventor： Akihiro Kimoto ,  Junnosuke Taguchi ,  Satoshi Yoshimoto ,  Norihiko Kishimoto ,  Keita Hayashi

IPC: H02K49/10 ,  F16H49/00

CPC classification number: H02K49/102 ,  F16H49/00

Abstract: A magnetic coupling device includes a driving magnet array having multiple annular sector-shaped, circumferentially arranged first permanent magnets, and a driven magnet array having multiple circular sector-shaped, circumferentially arranged second permanent magnets with pole surfaces facing pole surfaces of the first permanent magnets. The driven magnet array is rotated by the driving magnet array being rotated. A repulsion zone where a repulsive force acts is designed to have an area that is 5% to 15% of that of an attraction zone where an attractive force acts between a specific first permanent magnet and a specific second permanent magnet, with a radial first centerline of the specific first permanent magnet overlapping a radial second centerline of the specific second permanent magnet so that opposite poles face each other, including between first and second permanent magnets respectively adjacent the specific first and second permanent magnets with overlapping the centerlines.

公开(公告)号：US12217998B2

公开(公告)日：2025-02-04

申请号：US17128628

申请日：2020-12-21

Applicant: Tokyo Electron Limited

Inventor： Junnosuke Taguchi ,  Nobuhiro Takahashi

IPC: H01L21/687 ,  H01L21/683

Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table that is rotatably provided inside the vacuum chamber, a stage that is rotatable with respect to the rotary table, the stage having a center of rotation at a position spaced apart from a center of rotation of the rotary table, and the stage having a flange provided at a lower surface of the stage, a first holder and a second holder, the flange being sandwiched between the first holder and the second holder, and a pressing member configured to press the second holder in a direction in which the second holder comes closer to the first holder.

公开(公告)号：US11885003B2

公开(公告)日：2024-01-30

申请号：US17110719

申请日：2020-12-03

Applicant: Tokyo Electron Limited

Inventor： Junnosuke Taguchi ,  Yasutomo Kimura

IPC: C23C16/458 ,  H01L21/67 ,  C23C16/455

CPC classification number: C23C16/4584 ,  H01L21/67259 ,  C23C16/45544

Abstract: A rotational drive device includes a first rotator configured to rotate with respect to a stator, a plurality of second rotators configured to rotate with respect to the first rotator, a plurality of drivers configured to rotatably drive the respective second rotators, and a plurality of driver controllers configured to rotate integrally with the first rotator and to control rotation of the drivers, respectively, the respective driver controllers being connected to one another by a communication network.

公开(公告)号：US12272590B2

公开(公告)日：2025-04-08

申请号：US17820076

申请日：2022-08-16

Applicant: Tokyo Electron Limited

Inventor： Junnosuke Taguchi ,  Yasutomo Kimura ,  Hisashi Takahashi

IPC: H01L21/687 ,  C23C14/50

Abstract: A substrate processing apparatus includes a processing chamber configured to process a substrate by using a processing gas; a rotary table that is rotatably provided in the processing chamber; a stage on which the substrate is to be placed and that is configured to be rotatable relative to the rotary table at a position spaced apart from a center of rotation of the rotary table, a lift pin configured to be displaced relative to the stage to raise and lower the substrate; and a housing configured to house the lift pin when the lift pin is not unexposed from the stage. The lift pin and the housing have a closing structure that closes a gap between the lift pin and the housing.

公开(公告)号：US12255092B2

公开(公告)日：2025-03-18

申请号：US17502615

申请日：2021-10-15

Applicant: Tokyo Electron Limited

Inventor： Junnosuke Taguchi

IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687

Abstract: A substrate processing apparatus includes: a rotary table provided inside a processing container; a stage provided on an upper surface of the rotary table in order to mount a substrate thereon, and configured to revolve by a rotation of the rotary table; a heater configured to heat the substrate mounted on the stage; and a rotation shaft provided at a location that rotates together with the rotary table to freely rotate while supporting the stage, and including a low heat conductivity body formed of a material with a heat conductivity lower than that of the stage.

公开(公告)号：US10763147B2

公开(公告)日：2020-09-01

申请号：US16026395

申请日：2018-07-03

Applicant: TOKYO ELECTRON LIMITED

Inventor： Junnosuke Taguchi ,  Yuya Sasaki ,  Toshiya Chiba

IPC: H01L21/67 ,  G01N21/95 ,  H01L21/687 ,  G01B11/30

Abstract: A substrate warpage detection device for detecting warpage of a substrate loaded on a substrate loading region having a recess shape formed on a rotary table along a circumferential direction during rotation of the rotary table, includes a light transmitting part configured to transmit a light beam obliquely upward from a side of the rotary table such that a lower portion of the light beam collides with an upper end of a side surface of the rotary table and an upper portion of the light beam positioned more upward than the lower portion of the light beam passes a portion near the surface of the rotary table, and a light receiving part installed to face the light transmitting part and configured to receive the light beam passing the portion near the surface of the rotary table so as to detect an amount of received light.