公开(公告)号：US20210247286A1

公开(公告)日：2021-08-12

申请号：US17245220

申请日：2021-04-30

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato HAYASHI ,  Kohei NOGUCHI ,  Koudai HIGASHI ,  Makoto OGATA

IPC: G01N15/02 ,  H01L21/67

Abstract: According to one embodiment of the present disclosure, there is provided a substrate processing apparatus comprising: a supply passage through which fluid supplied to a substrate flows; and a foreign substance detector including a channel forming part forming a portion of the supply passage, a light projector irradiating light to the channel forming part, and a light receiver receiving light emitted from the channel forming part as a result of irradiating light to the channel forming part by the light projector, the foreign substance detector being configured to detect a foreign substance in the fluid based on a signal obtained by the light that the light receiver receives, wherein the light projector and the light receiver in the foreign substance detector are disposed in areas that are not opposite to each other in areas in upper, lower, left, right, front and rear directions of the channel forming part.

公开(公告)号：US20200240891A1

公开(公告)日：2020-07-30

申请号：US16746118

申请日：2020-01-17

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato HAYASHI ,  Kohei NOGUCHI ,  Koudai HIGASHI ,  Makoto OGATA

IPC: G01N15/02 ,  H01L21/67

Abstract: According to one embodiment of the present disclosure, there is provided a substrate processing apparatus comprising: a supply passage through which fluid supplied to a substrate flows; and a foreign substance detector including a channel forming part forming a portion of the supply passage, a light projector irradiating light to the channel forming part, and a light receiver receiving light emitted from the channel forming part as a result of irradiating light to the channel forming part by the light projector, the foreign substance detector being configured to detect a foreign substance in the fluid based on a signal obtained by the light that the light receiver receives, wherein the light projector and the light receiver in the foreign substance detector are disposed in areas that are not opposite to each other in areas in upper, lower, left, right, front and rear directions of the channel forming part.

公开(公告)号：US20220319893A1

公开(公告)日：2022-10-06

申请号：US17657194

申请日：2022-03-30

Applicant: Tokyo Electron Limited

Inventor： Junnosuke MAKI ,  Koudai HIGASHI ,  Ryo KONISHI ,  Hideki KAJIWARA ,  Hokuto SHIGEMOTO

IPC: H01L21/68 ,  H01L21/67 ,  H01L21/687

Abstract: An information acquisition system is for acquiring information about a substrate processing apparatus including a substrate holder configured to hold and rotate a substrate, a nozzle configured to supply a processing liquid to a surface of the substrate which is rotating, and a cup surrounding the substrate held by the substrate holder. The information acquisition system includes: an information acquisition body held in place of the substrate by the substrate holder and including an imaging part configured to image the cup and acquire image data; and an acquisition part configured to acquire information about a height of the cup based on the image data.

公开(公告)号：US20160093519A1

公开(公告)日：2016-03-31

申请号：US14861135

申请日：2015-09-22

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koudai HIGASHI ,  Shinichiro MISAKA

IPC: H01L21/67 ,  H05B3/00 ,  H05B3/20

CPC classification number: H01L21/67248 ,  H01L21/67109 ,  H05B1/0233

Abstract: A substrate heat treatment apparatus includes: a placement unit on which a substrate is placed; a heat treatment unit for heating or cooling the substrate on the placement unit; a plurality of temperature sensors positioned correspondingly to a plurality of locations of the substrate on the placement unit; and a control unit. The control unit is configured to control the heat treatment unit based on temperatures detected by the temperature sensors, to calculate a position of a thermal center of gravity of the substrate based on the temperatures detected by the temperature sensors, and to detect heat treatment condition of the substrate based on the position of the thermal center of gravity.

Abstract translation: 基板热处理装置包括：放置基板的放置单元; 用于在所述放置单元上加热或冷却所述基板的热处理单元; 多个温度传感器相对于所述基板在所述放置单元上的多个位置定位; 和控制单元。 控制单元被配置为基于由温度传感器检测到的温度来控制热处理单元，基于由温度传感器检测的温度来计算基板的热重心位置，并且检测热处理条件 基于基板的热重心位置。

公开(公告)号：US20150340258A1

公开(公告)日：2015-11-26

申请号：US14759824

申请日：2014-01-31

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato HIYASHI ,  Koudai HIGASHI

IPC: H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67265 ,  H01L21/67288 ,  H01L21/67712 ,  H01L21/67724 ,  H01L21/67772 ,  H01L21/67775 ,  H01L21/67778 ,  H01L21/68707

Abstract: A substrate transport apparatus for detecting with high accuracy rubbing between a substrate held in a substrate holding tool, and a support which transports a substrate. The substrate transport apparatus includes: a stage for placing thereon the substrate holding tool; a substrate transport mechanism including the support for the substrate, and a back-and-forth movement mechanism for moving the support, the mechanism configured to transfer a substrate to/from the substrate holding tool; a lifting mechanism for moving the support up and down with respect to the substrate holding tool; a sound amplifying section for amplifying a contact sound generated by contact between a substrate held in the substrate holding tool and the support; and a detection section for detecting rubbing between a substrate and the support based on a detection signal from a vibration sensor which detects a solid-borne sound, propagating through the substrate holding tool, and outputs the detection signal.

Abstract translation: 一种用于在保持在基板保持工具中的基板与传送基板的支撑体之间以高精度摩擦进行检测的基板输送装置。 基板输送装置包括：放置基板保持工具的台架; 包括用于基板的支撑件的基板输送机构和用于移动支撑件的前后移动机构，所述机构构造成将基板传送到基板保持工具或从基板保持工具传送基板; 提升机构，用于相对于所述基板保持工具上下移动所述支撑件; 用于放大由保持在基板保持工具中的基板与支撑体之间的接触而产生的接触声音的声音放大部分; 以及检测部，其基于来自检测固体声音的振动传感器的检测信号，检测基板和支撑体之间的摩擦，并通过基板保持工具传播，并输出检测信号。