公开(公告)号：US20160146539A1

公开(公告)日：2016-05-26

申请号：US14948673

申请日：2015-11-23

Applicant: TOKYO ELECTRON LIMITED

Inventor： Koyu HASEGAWA ,  Kyoko IKEDA

IPC: F27D3/00

CPC classification number: F27D3/0084 ,  F27D2003/0086 ,  H01L21/47 ,  H01L21/67017 ,  H01L21/67178 ,  H01L21/67766 ,  H01L21/67781

Abstract: A substrate transfer system includes a substrate transfer part capable of transferring a substrate while holding the substrate, an elevating mechanism including a support axis extending in an upper-lower direction and being capable of moving the substrate transfer part along the support axis within a predetermined range, a first exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis above an upper limit of the predetermined range, a second exhaust port located at a position selected from at least one of on the supporting axis and near the supporting axis below a lower limit of the predetermined range, and an exhaust part connected such that exhaust is available through the first exhaust port and the second exhaust port.

Abstract translation: 基板转印系统包括能够在保持基板的同时转印基板的基板转印部件，包括沿上下方向延伸的支撑轴线并能够将基板转印部件沿着支撑轴线移动到预定范围内的升降机构 位于从所述支撑轴线上的支撑轴线和所述支撑轴线附近的支撑轴线上方的位置的位置处的第一排气口，其高于所述预定范围的上限;第二排气口，位于从所述支撑轴承中的至少一个位置 并且靠近所述支撑轴线低于所述预定范围的下限，并且排气部分连接成使得可通过所述第一排气口和所述第二排气口排出废气。